Growth exponents of the etching model in high dimensions

Growth exponents of the etching model in high dimensions

In this work we generalize the etching model (Mello et al 2001 Phys. Rev. E 63 041113) to d + 1 dimensions. The dynamic exponents of this model are compatible with those of the Kardar-Parisi-Zhang universality class. We investigate the roughness dynamics with surfaces up to d=6. We show that the dat...

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Veröffentlicht in:arXiv.org 2017-07
Hauptverfasser: Rodrigues, Evandro A, Mello, Bernardo A, Oliveira, Fernando A
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Etching
Exponents
Physics - Statistical Mechanics
Substrates
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description In this work we generalize the etching model (Mello et al 2001 Phys. Rev. E 63 041113) to d + 1 dimensions. The dynamic exponents of this model are compatible with those of the Kardar-Parisi-Zhang universality class. We investigate the roughness dynamics with surfaces up to d=6. We show that the data from all substrate lengths and for all dimensions can be collapsed into one common curve. We determine the dynamic exponents as a function of the dimension. Moreover, our results suggest that d=4 is not an upper critical dimension for the etching model, and that it fulfills the Galilean invariance.
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subjects Etching
Exponents
Physics - Statistical Mechanics
Substrates
title Growth exponents of the etching model in high dimensions
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