High confinement, high yield Si3N4 waveguides for nonlinear optical application

In this paper we present a novel fabrication technique for silicon nitride (Si3N4) waveguides with a thickness of up to 900 nm, which are suitable for nonlinear optical applications. The fabrication method is based on etching trenches in thermally oxidized silicon and filling the trenches with Si3N4...

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Veröffentlicht in:	arXiv.org 2015-01
Hauptverfasser:	Epping, Jörn P, Hoekman, Marcel, Mateman, Richard, Leinse, Arne, Heideman, René G, Albert van Rees, Peter J M van der Slot, Lee, Chris J, Klaus-J Boller
Format:	Artikel
Sprache:	eng
Schlagworte:	Cracks Physics - Optics Silicon nitride Trenches Wave propagation Waveguides
Online-Zugang:	Volltext
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