Photoluminescence of patterned arrays of vertically stacked InAs/GaAs quantum dots

We report on photoluminescence measurements of vertically stacked InAs/GaAs quantum dots grown by molecular-beam epitaxy on focused ion beam patterned hole arrays with varying array spacing. Quantum dot emission at 1.24 eV was observed only on patterned regions, demonstrating preferential nucleation...

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Veröffentlicht in:arXiv.org 2010-12
Hauptverfasser: Saucer, T W, J -E Lee, Martin, A J, Tien, D, Millunchick, J M, Sih, V
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description We report on photoluminescence measurements of vertically stacked InAs/GaAs quantum dots grown by molecular-beam epitaxy on focused ion beam patterned hole arrays with varying array spacing. Quantum dot emission at 1.24 eV was observed only on patterned regions, demonstrating preferential nucleation of optically-active dots at desired locations and below the critical thickness for dot formation at these growth conditions. Photoluminescence measurements as a function of varying focused ion beam irradiated hole spacing showed that the quantum dot emission intensity increased with decreasing array periodicity, consistent with increasing dot density.
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subjects Arrays
Emission
Epitaxial growth
Ion beams
Molecular beam epitaxy
Nucleation
Periodic variations
Photoluminescence
Physics - Materials Science
Quantum dots
title Photoluminescence of patterned arrays of vertically stacked InAs/GaAs quantum dots
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