Shot noise measurements in a wide-channel transistor near pinch-off
We study a shot noise of a wide channel gated high-frequency transistor at temperature of 4.2K near pinch-off. In this regime, a transition from the metallic to the insulating state is expected to occur, accompanied by the increase of the partition noise. The dependence of the noise spectral density...
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Veröffentlicht in: | arXiv.org 2010-08 |
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Sprache: | eng |
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