Morphology Characterization of Argon-Mediated Epitaxial Graphene on C-face SiC
Epitaxial graphene layers were grown on the C-face of 4H- and 6H-SiC using an argon-mediated growth process. Variations in growth temperature and pressure were found to dramatically affect the morphological properties of the layers. The presence of argon during growth slowed the rate of graphene for...
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| creator | Tedesco, Joseph L Jernigan, Glenn G Culbertson, James C Hite, Jennifer K Yang, Yang Daniels, Kevin M Myers-Ward, Rachael L Eddy, Charles R Jr Robinson, Joshua A Trumbull, Kathleen A Wetherington, Maxwell T Campbell, Paul M Gaskill, D Kurt |
| description | Epitaxial graphene layers were grown on the C-face of 4H- and 6H-SiC using an argon-mediated growth process. Variations in growth temperature and pressure were found to dramatically affect the morphological properties of the layers. The presence of argon during growth slowed the rate of graphene formation on the C-face and led to the observation of islanding. The similarity in the morphology of the islands and continuous films indicated that island nucleation and coalescence is the growth mechanism for C-face graphene. |
| doi_str_mv | 10.48550/arxiv.1007.5064 |
| format | Article |
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The similarity in the morphology of the islands and continuous films indicated that island nucleation and coalescence is the growth mechanism for C-face graphene.</description><subject>Argon</subject><subject>Coalescing</subject><subject>Epitaxial growth</subject><subject>Graphene</subject><subject>Morphology</subject><subject>Nanotubes</subject><subject>Nucleation</subject><subject>Physics - Materials Science</subject><subject>Physics - Mesoscale and Nanoscale Physics</subject><subject>Physics - Other Condensed Matter</subject><issn>2331-8422</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GOX</sourceid><recordid>eNotj0FLwzAYhoMgOObuniTgufVrvyRtj6PMKWx6cPcSmy9rRm1q2snmr3dznt7Lw8vzMHaXQCxyKeFRh4P7jhOALJagxBWbpIhJlIs0vWGzYdgBQKqyVEqcsNe1D33jW7898rLRQdcjBfejR-c77i2fh63vojUZp0cyfNG7UR-cbvky6L6hjviJKyOra-Lvrrxl11a3A83-d8o2T4tN-Ryt3pYv5XwVaZmoCAuigqCQiEYU0tRgKSOTC2sJFKJM0IAkmyljhKmJBFohsYY6Nx86yXDK7i-3f61VH9ynDsfq3Fydm0_AwwXog__a0zBWO78P3UmpSiFXqKRQCn8B3d1ZkA</recordid><startdate>20100728</startdate><enddate>20100728</enddate><creator>Tedesco, Joseph L</creator><creator>Jernigan, Glenn G</creator><creator>Culbertson, James C</creator><creator>Hite, Jennifer K</creator><creator>Yang, Yang</creator><creator>Daniels, Kevin M</creator><creator>Myers-Ward, Rachael L</creator><creator>Eddy, Charles R</creator><creator>Jr</creator><creator>Robinson, Joshua A</creator><creator>Trumbull, Kathleen A</creator><creator>Wetherington, Maxwell T</creator><creator>Campbell, Paul M</creator><creator>Gaskill, D Kurt</creator><general>Cornell University Library, arXiv.org</general><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>L6V</scope><scope>M7S</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>GOX</scope></search><sort><creationdate>20100728</creationdate><title>Morphology Characterization of Argon-Mediated Epitaxial Graphene on C-face SiC</title><author>Tedesco, Joseph L ; 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| subjects | Argon Coalescing Epitaxial growth Graphene Morphology Nanotubes Nucleation Physics - Materials Science Physics - Mesoscale and Nanoscale Physics Physics - Other Condensed Matter |
| title | Morphology Characterization of Argon-Mediated Epitaxial Graphene on C-face SiC |
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