Chemical Stability toward O2 and H2O of Si(111) Grafted with CH3, CH2CH2CH3, CHCHCH3, and CCCH3

The chemical stability of compact monolayers on silicon toward oxidizing agents is a key issue for the use of such monolayers in devices such as solar cells or in the electronics industry. In this work, we investigated the reactivity toward H2O, O2, and OH species of monolayers terminated with a met...

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Veröffentlicht in:	Journal of physical chemistry. C 2015-01, Vol.119 (1), p.284-295
Hauptverfasser:	Soria, Federico A, Paredes-Olivera, Patricia, Patrito, Eduardo M
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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