Formation of SiO2 Air-Gap Patterns Through scCO2 Infusion of NIL Patterned PHEMA

Using templates generated by nanoimprint lithography, we report the fabrication of SiO2 patterns (∼450 nm) line widths over large active surface areas (14.5 cm2). The process involves the patterning of poly(2-hydroxyethyl methacrylate) (PHEMA) using polycarbonate molds followed by tetrachlorosilane...

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Veröffentlicht in:	Chemistry of materials 2010-02, Vol.22 (4), p.1445-1451
Hauptverfasser:	Ell, John R, Crosby, Todd A, Peterson, Joseph J, Carter, Kenneth R, Watkins, James J
Format:	Artikel
Sprache:	eng
Schlagworte:	Patterning of Materials (Micro- and Nanoscale) Precursor Routes to Materials (including Polymer-Derived Ceramics) Templated and Nanoimprinted Materials
Online-Zugang:	Volltext
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