Investigation of AlMe3, BEt3, and ZnEt2 as Co-Reagents for Low-Temperature Copper Metal ALD/Pulsed-CVD

The reactions of AlMe3, BEt3, and ZnEt2 with toluene solutions of the copper(II) complexes [CuL2] {L = acetylacetonate (acac; 1), hexafluoroacetylacetonate (hfac; 2), N-isopropyl-β-ketiminate (acnac; 3), N,N-dimethyl-β-diketiminate (nacnac; 4), 2-pyrrolylaldehyde (PyrAld; 5), N-isopropyl-2-pyrrolyla...

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Veröffentlicht in:	Chemistry of materials 2010-09, Vol.22 (17), p.4844-4853
Hauptverfasser:	Vidjayacoumar, Balamurugan, Emslie, David J. H, Clendenning, Scott B, Blackwell, James M, Britten, James F, Rheingold, Arnold
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical Vapor Deposition Coatings, Thin films, and Monolayers Precursor Routes to Materials (including Polymer-Derived Ceramics)
Online-Zugang:	Volltext
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