Improving the Properties of SrRuO3 Electrode Films Grown by Atomic Layer-Deposited SrO and Pulsed Chemical Vapor-Deposited RuO2 Using Al2O3 Capping Layers

In this study, an Al2O3 capping layer (ACL) was utilized to enhance the surface morphology and electrical properties of SrRuO3 (SRO) electrode films deposited via combined atomic layer deposition and pulsed chemical vapor deposition. To crystallize the SRO films, postdeposition annealing (PDA) was n...

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Veröffentlicht in:	ACS applied electronic materials 2023-08, Vol.5 (8), p.4494-4503
Hauptverfasser:	Lim, Junil, Kwon, Dae Seon, Seo, Haengha, Kim, Tae Kyun, Paik, Heewon, Shin, Jonghoon, Song, Haewon, Jang, Yoon Ho, Park, Yu-kyung, Lee, Keonuk, Kim, Young Sin, Choi, Jung-Hae, Hwang, Cheol Seong
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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