Probing the Electronic Surface Properties and Bandgap Narrowing of in situ N, W, and (W,N) Doped Magnetron-Sputtered TiO2 Films Intended for Electro-Photocatalytic Applications

We report on the optical and electronic properties of undoped, nitrogen (N) doped, tungsten (W) doped, and (W,N) doped TiO2 films deposited by RF magnetron sputtering process. The optical absorption edge of the N doped TiO2 films is shown to red-shift significantly as compared to the undoped TiO2 fi...

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Veröffentlicht in:	Journal of physical chemistry. C 2016-01, Vol.120 (1), p.631-638
Hauptverfasser:	Pandiyan, Rajesh, Delegan, Nazar, Dirany, Ahmad, Drogui, Patrick, El Khakani, My Ali
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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