Surface analysis in the semiconductor industry: Present use and future possibilities von Heide, Paul A.W., Spampinato, Valentina, Franquet, Alexis, Zborowski, Charlotte, Conard, Thierry, Ludwig, Jonathan, Paredis, Kristof, Vandervorst, Wilfried, Pirkl, Alexander, Niehuis, Ewald

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Critical need and future directions of SIMS depth profiling in CMOS fabrication von van der Heide, Paul A. W.

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Secondary ion mass spectrometry von Lockyer, Nicholas P., Aoyagi, Satoka, Fletcher, John S., Gilmore, Ian S., van der Heide, Paul A. W., Moore, Katie L., Tyler, Bonnie J., Weng, Lu-Tao

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Incorporation of Titanium into Mesoporous Silica Molecular Sieve SBA-15 von Luan, Zhaohua, Maes, Estelle M, van der Heide, Paul A. W, Zhao, Dongyuan, Czernuszewicz, Roman S, Kevan, Larry

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Preparation of I2@SWNTs:  Synthesis and Spectroscopic Characterization of I2-Loaded SWNTs von Kissell, Kyle R, Hartman, Keith B, Van der Heide, Paul A. W, Wilson, Lon J

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Single-Molecule I2@US-Tube Nanocapsules: A New X-ray Contrast-Agent Design von Ashcroft, J. M., Hartman, K. B., Kissell, K. R., Mackeyev, Y., Pheasant, S., Young, S., Van der Heide, P. A. W., Mikos, A. G., Wilson, L. J.

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Microscopic investigations of chemo-mechanical polishing of tungsten von Lim, Min Soo, van der Heide, Paul A.W., Perry, Scott S., Galloway, Heather C., Koeck, Deborah C.

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Implantation damage effect on boron annealing behavior using low-energy polyatomic ion implantation von Jin, Jian-Yue, Liu, Jiarui, van der Heide, Paul A. W., Chu, Wei-Kan

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Inverse velocities of sputtered monatomic ions: Systematics and quantification von LODDING, A. R, VAN DER HEIDE, P. A. W, BROWN, J. D, SÖDERVALL, U. S

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