Diffusion in intermetallic compounds: the ordered Cu3Au rule, its history von d’Heurle, François M., Gas, Patrick, Lavoie, Christian, Philibert, Jean

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Diffusion in intermetallic compounds: the ordered Cu 3 Au rule, its history von d’Heurle, François M., Gas, Patrick, Lavoie, Christian, Philibert, Jean

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Reactive Diffusion in the Ni-Si System: Phase Sequence and Formation of Metal-Rich Phases von Desjardins, P., Detavernier, Christophe, d'Heurle, François M., Cabral, C., Lavoie, C., Kellock, A.J., Coia, C.

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Diffusion - Reaction: The Ordered Cu3Au Rule and Its Corollaries von d'Heurle, François M., Gas, Patrick, Philibert, Jean

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Stress Development during the Reactive Formation of Silicide Films von Gergaud, Patrice, d'Heurle, François M., Thomas, Olivier, Rivero, Christian

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Phase formation and resistivity in the ternary system Ti–Nb–Si von Mouroux, Aliette, Roux, Marylène, Zhang, Shi-Li, d’Heurle, François M., Cabral, Cyril, Lavoie, Christian, Harper, James M. E.

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Exploring Thin-Film Reactions by Means of Simultaneous X-Ray Surface Roughness and Resistance Measurements von Cabral, C., d'Heurle, François M., Harper, J.M.E., Lavoie, C.

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Interface Reactions with Formation of a Solid Phase on a Solid Substrate: A Short Overview von d'Heurle, François M.

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Stresses during Silicide Formation: A Review von d'Heurle, François M., Thomas, Olivier

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On Reactive Diffusion: 1) Kinetics, Growth and Diffusion, 2) Equilibrium? von d'Heurle, François M., Zhang, S.-L., Gas, Patrick, Philibert, Jean

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Modellization of the Growth of Three Intermediate Phases von Zhang, S.-L., d'Heurle, François M.

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Nonequilibrium Formation of Compounds in Thin Films von d'Heurle, François M.

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Diffusion-Reaction: Growth and Nucleation von d'Heurle, François M., Gas, Patrick, Philibert, Jean

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Morphological Instabilities in Bilayers Incorporating Polycristalline Silicon von d'Heurle, François M., Nygren, S.

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Stability of Interfaces in Gold-Silicon System Regarding Equilibrium Segregation von Rolland, Andrée, Poisson, Christophe, d'Heurle, Francois M., Charaï, Ahmed

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Reactive Phase Formation: Some Theory and Applications von Gupta, Devendra

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Ion-implantation-induced fluorine agglomeration in tungsten disilicide prepared by low-pressure chemical vapour deposition von Petersson, C.Sture, Whitlow, Harry J., Keinonen, Juhani, D'heurle, François M., Le Goues, Françoise K., Joshi, Rajiv V., Scilla, Gerald, Thomas, Olivier

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Electromigration and failure in electronics: An introduction von d'Heurle, F.M.

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The Epitaxy of CoSi 2 on Si Substrates: A Review von Zhang, Shi‐Li, D'Heurle, Francois M.

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The Epitaxy of CoSi2 on Si Substrates: A Review von Zhang, Shi-Li, D'Heurle, Francois M.

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