Properties of doped and undoped crystals of single domain KTiOAsO4 von CHENG, L. K, CHENG, L.-T, BIERLEIN, J. D, ZUMSTEG, F. C, BALLMAN, A. A

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The Impact of Fluoropolymers on Line Edge Roughness in 193 nm Imaging von Zumsteg, F. C., Leffew, K. W., Feiring, A. E., Crawsfored, M. K., Fahnham, W. B., Petrov, V. A., Schadt, 1, III, Tran, H. V.

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Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm von Feiring, A.E., Crawford, M.K., Farnham, W.B., Feldman, J., French, R.H., Leffew, K.W., Petrov, V.A., Schadt, F.L., Wheland, R.C., Zumsteg, F.C.

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Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists von Crawford, M. K., Farnham, W. B., Feiring, A. E., Feldman, J., French, R. H., Leffew, K. W., Petrov, V. A., Schadt III, F. L., Zumsteg, F. C.

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Nonlinear optical and electro-optical properties of single crystal CsTiOAsO4 von CHENG, L. T, CHENG, L. K, BIERLEIN, J. D, ZUMSTEG, F. C

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The Impact of Fluoropolymers on Line Edge Roughness in 193nm Imaging von Zumsteg, F. C., Leffew, K. W., Feiring, A. E., Crawsfored, M. K., Fahnham, W. B., Petrov, V. A., Schadt III, 1, Tran, H. V.

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Development of the nonlinear optical crystal CsTiOAsO4. II: Crystal growth and characterization von CHENG, L. K, CHENG, L. T, ZUMSTEG, F. C, BIERLEIN, J. D, GALPERIN, J

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New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm von Feiring, Andrew E, Crawford, Michael K, Farnham, William B, Feldman, Jerald, French, Roger H, Junk, Christopher P, Leffew, Kenneth W, Petrov, Viacheslav A, Qiu, Weiming, Schadt, Frank L, Tran, Hoang V, Zumsteg, Fredrick C

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Bis(fluoroalcohol) Monomers and Polymers:  Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm von Feiring, Andrew E, Crawford, Michael K, Farnham, William B, French, Roger H, Leffew, Kenneth W, Petrov, Viacheslav A, Schadt, Frank L, Tran, Hoang V, Zumsteg, Fredrick C

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Effect of Spin-Lattice Coupling on the Critical Resistivity of a Ferromagnet von Zumsteg, F. C., Cadieu, F. J., Marčelja, S., Parks, R. D.

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Electrical Resistivity of Nickel Near the Curie Point von Zumsteg, F. C., Parks, R. D.

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Ferroelasticity in the LnNbO4-type rare earth niobates von Brixner, L.H., Whitney, J.F., Zumsteg, F.C., Jones, G.A.

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Heat capacity and magnetic susceptibility of ReO3 von Zumsteg, F.C., Pearsall, T.

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Fluoropolymers for 157nm Lithography von K. Crawford, M, B. Farnham, W, E. Feiring, A, Feldman, J, H. French, R, W. Leffew, K, A. Petrov, V, L. Schadt III, F, C. Zumsteg, F

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Index of refraction measurements and parametric generation in hydrothermally grown KTiOPO_4 von Vanherzeele, Herman, Bierlein, J. D., Zumsteg, F. C.

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Acentricity and phase transitions for some AM2X6 compounds von Sleight, A.W., Zumsteg, F.C., Barkley, J.R., Gulley, J.E.

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Fluoropolymers for 157nm Lithography: Performance of Single Layer Resists von Crawford, M. K., Farnham, W. B., Feiring, A. E., Feldman, J., French, R. H., Leffew, K. W., Petrov, V. A., Schadt, F. L., III, Zumsteg, F. C.

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Crystal data for Na4Mg2Si3O10 von Foris, C. M., Zumsteg, F. C., Shannon, R. D.

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Response to ‘‘Comment on ‘Nonlinear optical and electro-optical properties of single crystal CsTiOAsO4’ ’’ [Appl. Phys. Lett. 64, 2457 (1994)] von Cheng, L. T., Cheng, L. K., Bierlein, J. D., Zumsteg, F. C.

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Heat Flow in a Superconductor in the Vortex State von Parks, R. D., Zumsteg, F. C., Mochel, J. M.

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