Effect of Al co-doping on the electrical and magnetic properties of Cu-doped ZnO nanorods von Wu, Z.F., Cheng, K., Zhang, F., Guan, R.F., Wu, X.M., Zhuge, L.J.

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Template-Free Preparation of Hollow Sb2S3 Microspheres as Supports for Ag Nanoparticles and Photocatalytic Properties of the Constructed Metal-Semiconductor Nanostructures von Cao, X. B., Gu, L., Zhuge, L. J., Gao, W. J., Wang, W. C., Wu, S. F.

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Structure and photoluminescence properties of Fe-doped ZnO thin films von Chen, A J, Wu, X M, Sha, Z D, Zhuge, L J, Meng, Y D

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Temperature dependence of electrical properties for MOS capacitor with HfO2/SiO2 gate dielectric stack von Yu, T., Jin, C.G., Dong, Y.J., Cao, D., Zhuge, L.J., Wu, X.M.

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Effect of NH3 plasma treatment on the interfacial property between ultrathin HfO2 and strained Si0.65Ge0.35 substrate von Yu, T., Jin, C. G., Yang, Y., Zhuge, L. J., Wu, X. M., Wu, Z. F.

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Electrical properties improvement of high-k HfO2 films by combination of C4F8 dual-frequency capacitively coupled plasmas treatment with thermal annealing von Zhang, H.Y., Ye, C., Jin, C.G., Wu, M.Z., Wang, Y.Y., Zhang, Z., Huang, T.Y., Yang, Y., He, H.J., Zhuge, L.J., Wu, X.M.

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Controllable nitrogen incorporation in HfO2 films by modulating capacitively-combined inductively-coupled plasmas von Jin, C G, Yang, Y, Zhang, H Y, Huang, T Y, Wu, M Z, Zhuge, L J, Wu, X M, Ye, C

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Influence of thickness and annealing temperature on the electrical, optical and structural properties of AZO thin films von Wang, F., Wu, M.Z., Wang, Y.Y., Yu, Y.M., Wu, X.M., Zhuge, L.J.

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Effect of nitrogen passivation on the interfacial property and band offset of HfLaO/SiGe von Yang, Y, Jin, C G, Zhuge, L J, Zhang, H Y, Wu, Z F, Wu, X M, Yu, T

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Role of high-frequency power in C4F8 dual-frequency capacitively coupled plasmas treating high-k HfO2 films von Zhang, H Y, Yang, X M, Yu, T, Jin, C G, Ye, C, Zhuge, L J, Wu, X M

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Helicon Plasma Discharge in a Toroidal Magnetic Field of the Tokamak von Jin, C. G., Yu, T., Zhao, Y., Bo, Y., Ye, C., Hu, J. S., Zhuge, L. J., Ge, S. B., Wu, X. M., Ji, H. T., Li, J. G.

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Study on changes in the structure of HfSiO and HfSiON dielectrics with different annealing temperature by photoelectron spectroscopy von Yang, X.M., Yu, T., Wu, X.M., zhuge, L.J., Ge, S.B., He, J.J.

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Initial study on the structure and optical properties of Zn1-xFexO films von CHEN, Z. C, ZHUGE, L. J, WU, X. M, MENG, Y. D

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Electric and magnetic properties of Cr-doped SiC films grown by dual ion beam sputtering deposition von Jin, C G, Wu, X M, Zhuge, L J, Sha, Z D, Hong, B

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The structure and photoluminescence properties of Cr-doped SiC films von Jin, C.G., Wu, X.M., Zhuge, L.J.

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The influence of assisted ion beam bombardment on structure and electrical characteristics of HfSiO dielectric synthesized by DIBSD von Yang, X.M., Zhuge, L.J., Wu, X.M., Yu, T., Ge, S.B.

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Initial study on the structure and photoluminescence properties of SiC films doped with Al von Sha, Z.D., Wu, X.M., Zhuge, L.J.

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Effect of defects on room-temperature ferromagnetism of Cr-doped ZnO films von Zhuge, L.J., Wu, X.M., Wu, Z.F., Chen, X.M., Meng, Y.D.

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Structure and deep ultraviolet emission of Co-doped ZnO films with Co3O4 nano-clusters von Zhuge, L J, Wu, X M, Wu, Z F, Yang, X M, Chen, X M, Chen, Q

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Plasmon-inducing enhancement for multi-band light emission from ZnO film via periodic ordered Ag nanoparticles von Wu, Z.F., Cheng, K., Zhang, F., Guan, R.F., Wu, X.M., Zhuge, L.J.

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