Formation of micro- and nanostructures with well-rounded profile by new e-beam lithography principle von Bruk, M.A., Zhikharev, E.N., Rogozhin, A.E., Streltsov, D.R., Kalnov, V.A., Averkin, S.N., Spirin, A.V.

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The new dry method of mask (relief) formation by direct electron-beam etching of resist von Bruk, M.A., Zhikharev, E.N., Streltsov, D.R., Kalnov, V.A., Spirin, A.V.

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Investigation of new dry high sensitive resist using 100 kV electron lithography von Babin, S.V., Holopkin, A.I., Lyakhov, M.N., Valiev, K.A., Velikov, L.V., Zhikharev, E.N.

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METHOD OF APPLYING HIGH-RESOLUTION IMAGE OF FUNCTIONAL LAYERS BASED ON THIN POLYMER FILMS ON THE SURFACE OF SOLIDS von BUZIN A.I, BRUK M.A, SPIRIN A.V, KARDASH I.E, KAL'NOV V.A, ZHIKHAREV E.N

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METHOD OF APPLYING THIN POLYMER LAYERS ON SURFACE OF SOLIDS von BRUK M.A, SPIRIN A.V, KARDASH I.E, TELESHOV EH.N, KAL'NOV V.A, ZHIKHAREV E.N

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