Advanced Interconnects: Materials, Processing, and Reliability von Baklanov, Mikhail R., Adelmann, Christoph, Zhao, Larry, De Gendt, Stefan

Volltext

Nanoscale Noncontact Subsurface Investigations of Mechanical and Optical Properties of Nanoporous Low-k Material Thin Film von Lomonosov, Alexey M, Ayouch, Adil, Ruello, Pascal, Vaudel, Gwenaelle, Baklanov, Mikhail R, Verdonck, Patrick, Zhao, Larry, Gusev, Vitalyi E

Volltext

Direct observation of the 1 / E dependence of time dependent dielectric breakdown in the presence of copper von Zhao, Larry, Tőkei, Zsolt, Croes, Kristof, Wilson, Christopher J., Baklanov, Mikhail, Beyer, Gerald P., Claeys, Cor

Volltext

Influence of porosity on electrical properties of low-k dielectrics von Van Besien, Els, Pantouvaki, Marianna, Zhao, Larry, De Roest, David, Baklanov, Mikhail R., Tőkei, Zsolt, Beyer, Gerald

Volltext

Evaluations of intrinsic time dependent dielectric breakdown of dielectric copper diffusion barriers von Zhao, Larry, Lofrano, Melina, Croes, Kristof, Van Besien, Els, Tőkei, Zsolt, Wilson, Christopher J., Degraeve, Robin, Kauerauf, Thomas, Beyer, Gerald P., Claeys, Cor

Volltext

Advanced Organic Polymer for the Aggressive Scaling of Low-$k$ Materials von Pantouvaki, Marianna, Huffman, Craig, Zhao, Larry, Heylen, Nancy, Ono, Yukiharu, Nakajima, Michio, Nakatani, Koji, Beyer, Gerald P, Baklanov, Mikhail R

Volltext

Diagnostic role of immunohistochemistry in the evaluation of breast pathology specimens von Zhao, Larry, Yang, Xiaofang, Khan, Ashraf, Kandil, Dina

Volltext

Microstructural characterization of inlaid copper interconnect lines von BESSER, Paul R, ZSCHECH, Ehrenfried, BAKER, Brett, BRAECKELMANN, Greg, ZHAO, Larry, SIMPSON, Cindy, CAPASSO, Cristiano, KAWASAKI, Hisao, WEITZMAN, Elizabeth, BLUM, Werner, WINTER, Delrose, ORTEGA, Richard, ROSE, Stewart, HERRICK, Matt, GALL, Martin, THRASHER, Stacye, TINER, Mike

Volltext

Effect of porogen residue on electrical characteristics of ultra low- k materials von Baklanov, Mikhail R., Zhao, Larry, Besien, Els Van, Pantouvaki, Marianna

Volltext

Impact of carbon-doping on time dependent dielectric breakdown of SiO2-based films von Zhao, Larry, Barbarin, Yohan, Croes, Kristof, Baklanov, Mikhail R., Verdonck, Patrick, Tőkei, Zsolt, Claeys, Cor

Volltext

Role of copper in time dependent dielectric breakdown of porous organo-silicate glass low-k materials von Zhao, Larry, Pantouvaki, Marianna, Croes, Kristof, Tőkei, Zsolt, Barbarin, Yohan, Wilson, Christopher J., Baklanov, Mikhail R., Beyer, Gerald P., Claeys, Cor

Volltext

Synchrotron measurement of the effect of linewidth scaling on stress in advanced Cu/Low- k interconnects von Wilson, Christopher J., Croes, Kristof, Zhao, Chao, Metzger, Till H., Zhao, Larry, Beyer, Gerald P., Horsfall, Alton B., O'Neill, Anthony G., Tőkei, Zsolt

Volltext

Advanced Interconnects: Materials, Processing, and Reliability von Baklanov, Mikhail R, Adelmann, Christoph, Zhao, Larry, De Gendt, Stefan

Volltext

Study of metal barrier deposition-induced damage to porous low- k materials von Zhao, Larry, Volders, Henny, Baklanov, Mikhail, Tőkei, Zsolt, Pantouvaki, Marianna, Wilson, Christopher J., Van Besien, Els, Beyer, Gerald P., Claeys, Cor

Volltext

Communication-The Impact of TaN Barrier Processes on Different Ultra Low-k Dielectrics von Zhang, Xunyuan, Gillot, Christophe, Zhao, Larry, Ryan, E. Todd, Wu, Chen

Volltext

Texture characterization of Cu interconnects with different Ta-based sidewall diffusion barriers von Wilson, Christopher J., Zhao, Chao, Volders, Henny, Zhao, Larry, Croes, Kristof, Tőkei, Zsolt, Beyer, Gerald P.

Volltext

Ultra Low Dielectric Constant Materials for 22 nm Technology Node and Beyond von Baklanov, Mikhail R., Smirnov, Evgeny A., Zhao, Larry

Volltext

Ultra Low-k Materials: Challenges of Scaling von Zhao, Larry, Baklanov, Mikhail, Pantouvaki, Marianna, Tőkei, Zsolt, Beyer, Gerald

Volltext

Study of Chemical Vapor Deposition of Manganese on Porous SiCOH Low-k Dielectrics Using Bis(ethylcyclopentadienyl)manganese von Jourdan, Nicolas, Krishtab, Mikhail B., Baklanov, Mikhail R., Meersschaut, Johan, Wilson, Christopher J., Ablett, James M., Fonda, Emiliano, Zhao, Larry, Van Elshocht, Sven, Tökei, Zsolt, Vancoille, Eric

Volltext

Advanced Organic Polymer for the Aggressive Scaling of Low- k Materials von Pantouvaki, Marianna, Huffman, Craig, Zhao, Larry, Heylen, Nancy, Ono, Yukiharu, Nakajima, Michio, Nakatani, Koji, Beyer, Gerald P., Baklanov, Mikhail R.

Volltext