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A Multi-Scale Study on Silicon-Oxide Etching Processes in C4F8/Ar Plasmas von 眭佳星 张赛谦 刘增 阎军 戴忠玲

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Ion Transport to a Photoresist Trench in a Radio Frequency Sheath von 张赛谦 戴忠玲 王友年

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Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias waveforms von MA, Xiaoqin, ZHANG, Saiqian, DAI, Zhongling, WANG, Younian

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A Multi-Scale Study on Silicon-Oxide Etching Processes in C 4 F 8 /Ar Plasmas von Sui, Jiaxing, Zhang, Saiqian, Liu, Zeng, Yan, Jun, Dai, Zhongling

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A Multi-Scale Study on Silicon-Oxide Etching Processes in C sub(4)F sub(8)/Ar Plasmas von Jiaxing, Sui, Saiqian, Zhang, Zeng, Liu, Jun, Yan, Zhongling, Dai

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A Multi-Scale Study on Silicon-Oxide Etching Processes in C4F8/Ar Plasmassupported by National Natural Science Foundation of China (No. 11375040) and the Important National Science... von Sui, Jiaxing, Zhang, Saiqian, Liu, Zeng, Yan, Jun, Dai, Zhongling

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Study on atomic layer etching of Si in inductively coupled Ar/Cl_2 plasmas driven by tailored bias waveforms von 麻晓琴 张赛谦 戴忠玲 王友年

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Semiconductor device for condition-controlled radio frequency system von Tan, Huaqiang, Zhang, Saiqian

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SEMICONDUCTOR PROCESSING APPARATUS AND METHOD von Wang, Zhuo, Zhang, Saiqian

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DEVICE FOR ADJUSTING PLASMA EDGE IN PROCESSING CHAMBER AND CONTROL METHOD THEREOF von Li, Jian, Zhang, Saiqian

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Radio frequency connector for heating plate and radio frequency connecting assembly von ZHANG SAIQIAN

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SEMICONDUCTOR DEVICE FOR CONDITION-CONTROLLED RADIO FREQUENCY SYSTEM von Tan, Huaqiang, Zhang, Saiqian

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Wafer supporting device and semiconductor process equipment von ZHANG SAIQIAN

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Plasma processing device and use method thereof von ZHANG SAIQIAN

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Wafer supporting device and semiconductor process equipment von ZHANG SAIQIAN

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Wafer supporting seat and process cavity von ZHANG SAIQIAN

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SEMICONDUCTOR PROCESSING APPARATUS AND METHOD von Wang, Zhuo, Zhou, Ren, Zhang, Saiqian

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Radio frequency loop and device von ZHANG SAIQIAN, ZHOU WEIJIE

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Heating device and plasma equipment von ZHANG SAIQIAN, GUO DONG

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