Synthesis of polymer nanocomposites by UV-curing of organoclay–acrylic resins von Keller, L., Decker, C., Zahouily, K., Benfarhi, S., Le Meins, J.M., Miehe-Brendle, J.

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Synthesis of clay nanocomposite materials by light-induced crosslinking polymerization von Benfarhi, S., Decker, C., Keller, L., Zahouily, K.

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Performance analysis of acylphosphine oxides in photoinitiated polymerization von DECKER, C, ZAHOUILY, K, DECKER, D, NGUYEN, T, VIET, Thi

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Photodegradation and photooxidation of thermoset and UV-cured acrylate polymers von Decker, C., Zahouily, K.

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Ultrafast synthesis of bentonite-acrylate nanocomposite materials by UV-radiation curing von DECKER, C, ZAHOUILY, K, KELLER, L, BENFARHI, S, BENDAIKHA, T, BARON, J

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Synthesis of nanocomposite polymers by UV-radiation curing von Decker, Christian, Keller, Laurent, Zahouily, Khalid, Benfarhi, Said

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Photostabilization of polymeric materials by photoset acrylate coatings von Decker, C., Zahouily, K.

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Photostabilisation of organic coatings von Decker, C., Biry, S., Zahouily, K.

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Light-stabilization of polymeric materials by grafted UV-cured coatings von Decker, C., Zahouily, K.

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Polymeric photoinitiators bearing side-chain benzoin methyl ether moieties: reactivity and excited-state processes von Fouassier, J.P., Ruhlmann, D., Zahouily, K., Angiolini, L., Carlini, C., Lelli, N.

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Photostabilization of polymeric materials by photoset acrylate coatings von Decker, C, Zahouily, K

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Curing and Photostabilization of Thermoset and Photoset Acrylate Polymers von Decker, Christian, Zahouily, Khalid, Valet, Andreas

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Weathering performance of thermoset and photoset acrylate coatings von DECKER, C, ZAHOUILY, K, VALET, A

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STRUCTURE PROPERTY RELATIONS IN PHOTOINITIATORS OF POLYMERIZATION .4. COPOLYMERIZABLE PHOTOINITIATORS von RUHLMANN, D, ZAHOUILY, K, FOUASSIER, JP

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Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists von Voisin, P., Zelsmann, M., Ridaoui, H., Chouiki, M., Gourgon, C., Boussey, J., Zahouily, K.

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Photopolymerization kinetic study of UV nanoimprint lithographydedicated resists von Voisin, P., Zelsmann, M., Ridaoui, H., Chouiki, M., Gourgon, C., Boussey, J., Zahouily, K.

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Relations structure-proprietes dans les photoamorceurs de polymerisation—4. Les photoamorceurs copolymerisables von Ruhlmann, D., Zahouily, K., Fouassier, J.P.

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Relations structure-propriétés dans les photoamorceurs de polymerisation. IV: Les photoamorceurs copolymerisables von RUHLMANN, D, ZAHOUILY, K, FOUASSIER, J. P

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Sulfoxides in radical chemistry. High 1,2-asymmetric induction in radical cyclizations von Imboden, Christoph, Bourquard, Thierry, Corminboeuf, Olivier, Renaud, Philippe, Schenk, Kurt, Zahouily, Mohamed

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