Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects von Zyulkov, Ivan, Krishtab, Mikhail, De Gendt, Stefan, Armini, Silvia

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Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films von Zyulkov, Ivan, Madhiwala, Viraj, Voronina, Ekaterina, Snelgrove, Matthew, Bogan, Justin, O’Connor, Robert, De Gendt, Stefan, Armini, Silvia

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High sensitivity Rutherford backscattering spectrometry using multidetector digital pulse processing von Laricchiuta, Grazia, Vandervorst, Wilfried, Zyulkov, Ivan, Armini, Silvia, Meersschaut, Johan

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Selective electroless deposition of cobalt using amino-terminated SAMs von Zyulkov, Ivan, Armini, Silvia, Opsomer, Karl, Detavernier, Christophe, De Gendt, Stefan

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Selective Metal Deposition for Advanced Metallization Schemes von Zyulkov, Ivan

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Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects von Zyulkov, Ivan, Krishtab, Mikhail, De Gendt, Stefan, Armini, Silvia

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Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films von Zyulkov, Ivan, Madhiwala, Viraj, Voronina, Ekaterina, Snelgrove, Matthew, Bogan, Justin, O'Connor, Robert, De Gendt, Stefan, Armini, Silvia

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Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration von Zyulkov, Ivan, Voronina, Ekaterina, Krishtab, Mikhail, Voloshin, Dmitry, Chan, B. T, Mankelevich, Yuri, Rakhimova, Tatyana, Armini, Silvia, De Gendt, Stefan

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Selective electroless deposition of cobalt using amino-terminated SAMs von Zyulkov, Ivan, Armini, Silvia, Opsomer, Karl, Detavernier, Christophe, De Gendt, Stefan

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(Invited) Selective Metal Deposition for Advanced Metallization Schemes von Zyulkov, Ivan, Armini, Silvia, De Gendt, Stefan

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METHOD FOR MAKING METAL TRIMETHYLENEMETHANE-CARBONYL COMPLEXES von SCHORN, Wolf, KARCH, Ralf, RAU, Nicholas, ZYULKOV, Ivan, GLÜER, Arne, FREY, Annika

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METHOD FOR MAKING METAL TRIMETHYLENEMETHANE-CARBONYL COMPLEXES von SCHORN, Wolf, KARCH, Ralf, RAU, Nicholas, ZYULKOV, Ivan, GLÜER, Arne, FREY, Annika

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Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration von Zyulkov, Ivan, Voronina, Ekaterina, Krishtab, Mikhail, Voloshin, Dmitry, Chan, B.T, Mankelevich, Yuri, Rakhimova, Tatyana, Armini, Silvia, De Gendt, Stefan

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Methods and related systems for depositing EUV sensitive films von Dezelah, Charles, Piumi, Daniele, Zyulkov, Ivan, De Roest, David Kurt, Patel, Kishan Ashokbhai, Givens, Michael, Tomczak, Yoann

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A METHOD FOR PATTERNING A TARGET LAYER von BRIGGS, Basoene, DEVRIENDT, Katia, ZYULKOV, Ivan

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METHOD FOR MAKING METAL TRIMETHYLENEMETHANE-CARBONYL COMPLEXES von SCHORN, Wolf, KARCH, Ralf, RAU, Nicholas, ZYULKOV, Ivan, GLÜER, Arne, FREY, Annika

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METHOD OF FORMING PATTERNED STRUCTURES von Piumi, Daniele, Dezelah, Charles, Zyulkov, Ivan, de Roest, David Kurt, Givens, Michael Eugence, Tomczak, Yoann

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METHOD FOR MAKING METAL TRIMETHYLENEMETHANE-CARBONYL COMPLEXES von SCHORN, Wolf, KARCH, Ralf, GLUER, Arne, RAU, Nicholas, ZYULKOV, Ivan, FREY, Annika

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METHOD OF TREATING A SUBSTRATE von Tomczak, Yoann Francis, Liu, Zecheng, Zyulkov, Ivan, Yoshida, Takashi, Sun, Yiting, de Roest, David, Nakano, Ryu

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METHOD OF PATTERNING TARGET LAYER von Devriendt, Katia, Briggs, Basoene, Zyulkov, Ivan

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