Phosphorylation and Regulation of Raf by Akt (Protein Kinase B) von Zimmermann, Sven, Moelling, Karin

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2D Scanning Micromirror with Large Scan Angle and Monolithically Integrated Angle Sensors Based on Piezoelectric Thin Film Aluminum Nitride von Meinel, Katja, Melzer, Marcel, Stoeckel, Chris, Shaporin, Alexey, Forke, Roman, Zimmermann, Sven, Hiller, Karla, Otto, Thomas, Kuhn, Harald

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Regulation of Raf-Akt Cross-talk von Moelling, Karin, Schad, Karen, Bosse, Magnus, Zimmermann, Sven, Schweneker, Marc

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Static High Voltage Actuation of Piezoelectric AlN and AlScN Based Scanning Micromirrors von Stoeckel, Chris, Meinel, Katja, Melzer, Marcel, Žukauskaitė, Agnė, Zimmermann, Sven, Forke, Roman, Hiller, Karla, Kuhn, Harald

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A plasma assisted in situ restoration process for sidewall damaged ULK dielectrics von Koehler, Nicole, Fischer, Tobias, Zimmermann, Sven, Schulz, Stefan E.

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Differentiation Stage-Specific Inhibition of the Raf-MEK-ERK Pathway by Akt von Rommel, Christian, Clarke, Brian A., Zimmermann, Sven, Nuñez, Lorna, Rossman, Roni, Reid, Kristina, Moelling, Karin, Yancopoulos, George D., Glass, David J.

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On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes von Haase, Micha, Melzer, Marcel, Lang, Norbert, Ecke, Ramona, Zimmermann, Sven, van Helden, Jean-Pierre H., Schulz, Stefan E.

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Regulation of Raf by Akt Controls Growth and Differentiation in Vascular Smooth Muscle Cells von Reusch, H. Peter, Zimmermann, Sven, Schaefer, Michael, Paul, Martin, Moelling, Karin

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Wiseman-Milburn control for the Lipkin-Meshkov-Glick model von Zimmermann, Sven, Kopylov, Wassilij, Schaller, Gernot

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Piezoelectric Scanning Micromirror With Built-In Sensors Based on Thin Film Aluminum Nitride von Meinel, Katja, Stoeckel, Chris, Melzer, Marcel, Zimmermann, Sven, Forke, Roman, Hiller, Karla, Otto, Thomas

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Plastic Waste RecyclingA Chemical Recycling Perspective von Schade, Alexander, Melzer, Marcel, Zimmermann, Sven, Schwarz, Thomas, Stoewe, Klaus, Kuhn, Harald

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Integration of (Poly‐Si/Air)n Distributed Bragg Reflectors in a 150 mm Bulk Micromachined Wafer‐Level MOEMS Fabrication Process von Helke, Christian, Seiler, Jan, Meinig, Marco, Großmann, Toni Dirk, Bonitz, Jens, Haase, Micha, Zimmermann, Sven, Ebermann, Martin, Kurth, Steffen, Reuter, Danny, Hiller, Karla

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Integration of (Poly‐Si/Air)n Distributed Bragg Reflectors in a 150mm Bulk Micromachined Wafer‐Level MOEMS Fabrication Process von Helke, Christian, Seiler, Jan, Meinig, Marco, Großmann, Toni Dirk, Bonitz, Jens, Haase, Micha, Zimmermann, Sven, Ebermann, Martin, Kurth, Steffen, Reuter, Danny, Hiller, Karla

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Liquid Crystalline Nanowires in Porous Alumina:  Geometric Confinement versus Influence of Pore Walls von Steinhart, Martin, Zimmermann, Sven, Göring, Petra, Schaper, Andreas K., Gösele, Ulrich, Weder, Christoph, Wendorff, Joachim H.

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MEK1 mediates a positive feedback on Raf-1 activity independently of Ras and Src von ZIMMERMANN, S, ROMMEL, C, ZIOGAS, A, LOVRIC, J, MOELLING, K, RADZIWILL, G

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The dielectric response of low-k interlayer dielectric material characterized by electron energy loss spectroscopy von Singh, Pradeep K., Knaup, Jan M., Zimmermann, Sven, Schulze, Steffen, Schulz, Stefan E., Frauenheim, Thomas, Hietschold, Michael

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Influence of porosity and methyl doping inside silica network: An electron diffraction and DFTB analysis von Singh, Pradeep K., Knaup, Jan M., Zimmermann, Sven, Schulze, Steffen, Schulz, Stefan E., Frauenheim, Thomas, Hietschold, Michael

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The cellular ratio of immune tolerance (immunoCRIT) is a definite marker for aggressiveness of solid tumors and may explain tumor dissemination patterns von Türbachova, Ivana, Schwachula, Tim, Vasconcelos, Ines, Mustea, Alexander, Baldinger, Tina, Jones, Katherine A, Bujard, Hermann, Olek, Alexander, Olek, Klaus, Gellhaus, Katharina, Braicu, Ioana, Könsgen, Dominique, Fryer, Christy, Ravot, Elisabetta, Hellwag, Alexander, Westerfeld, Nicole, Gruss, Oliver J, Meissner, Markus, Hasan, Mazahir T, Weber, Michael, Hoffmüller, Ulrich, Zimmermann, Sven, Loddenkemper, Christoph, Mahner, Sven, Babel, Nina, Berns, Els, Adams, Richard, Zeilinger, Robert, Baron, Udo, Vergote, Ignace, Maughan, Tim, Marme, Frederik, Dickhaus, Thorsten, Sehouli, Jalid, Olek, Sven

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Wetting Behavior of Plasma Etch Residue Removal Solutions on Plasma Damaged and Repaired Porous ULK Dielectrics von Krüger, Stephan, Köhler, Nicole, Ahner, Nicole, Zimmermann, Sven, Schulz, Stefan E.

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Optimized Wetting Behavior of Water-Based Cleaning Solutions for Plasma Etch Residue Removal by Application of Surfactants von Schulz, Stefan E., Schaller, Matthias, Ahner, Nicole, Zimmermann, Sven

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