Heterogeneities among credit risk parameter distributions: the modality defines the best estimation method von Gürtler, Marc, Zöllner, Marvin

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Gettering and Defect Engineering in Semiconductor Technology (GADEST 2019) von Kissinger, Gudrun, Kot, Dawid, Richter, Hans, Zöllner, Marvin

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Ge/SiGe multiple quantum well fabrication by reduced-pressure chemical vapor deposition von Yamamoto, Yuji, Skibitzki, Oliver, Schubert, Markus Andreas, Scuderi, Mario, Reichmann, Felix, Zöllner, Marvin H., De Seta, Monica, Capellini, Giovanni, Tillack, Bernd

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Low Disorder and High Mobility 2DEG in Si/SiGe Fabricated in 200 mm BiCMOS Pilot line von Mistroni, Alberto, Reichmann, Felix, Yamamoto, Yuji, Zöllner, Marvin Hartwig, Capellini, Giovanni, Diebel, Laura, Bougeard, Dominique, Lisker, Marco

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3-Dimensional Self-Ordered Multilayered Ge Nanodots on SiGe von Wen, Wei-Chen, Schubert, Markus Andreas, Zöllner, Marvin Hartwig, Tillack, Bernd, Yamamoto, Yuji

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(Invited) Advancing Si Spin Qubit Research: Process Integration of Hall Bar FETs on Si/SiGe in a 200mm BiCMOS Pilot Line von Reichmann, Felix, Mistroni, Alberto, Yamamoto, Yuji, Kulse, Philipp, Marschmeyer, Steffen, Wolansky, Dirk, Fursenko, Oksana, Zöllner, Marvin Hartwig, Capellini, Giovanni, Diebel, Laura, Bougeard, Dominique, Lisker, Marco

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Nickel Texture Adjustment on Si and Ge and Its Impact on Nickel Silicide and Germanide von Wolansky, Dirk, Zaumseil, Peter, Zöllner, Marvin, Schulze, Sebastian

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Titanium Nitride Plasmonic Nanohole Arrays for CMOS-Compatible Integrated Refractive Index Sensing: Influence of Layer Thickness on Optical Properties von Reiter, Sebastian, Han, Weijia, Mai, Christian, Spirito, Davide, Jose, Josmy, Zöllner, Marvin, Fursenko, Oksana, Schubert, Markus Andreas, Stemmler, Ivo, Wenger, Christian, Fischer, Inga Anita

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The Lattice Strain Distribution in Ge x Sn 1-x Micro-Disks Investigated at the Sub 100-nm Scale von Corley-Wiciak, Cedric, Zöllner, Marvin Hartwig, Corley-Wiciak, Agnieszka Anna, Rovaris, Fabrizio, Sfruncia, Gianfranco, Nicotra, Giuseppe, Zaitsev, Ignati, Manganelli, Costanza Lucia, Zatterin, Edoardo, Spirito, Davide, Marzegalli, Anna, Schulli, Tobias, Von Den Driesch, Nils, Buca, Dan, Montalenti, Francesco, Richter, Carsten, Capellini, Giovanni

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The Lattice Strain Distribution in GexSn1-x Micro-Disks Investigated at the Sub 100-nm Scale von Corley-Wiciak, Cedric, Zöllner, Marvin Hartwig, Corley-Wiciak, Agnieszka Anna, Rovaris, Fabrizio, Sfruncia, Gianfranco, Nicotra, Giuseppe, Zaitsev, Ignati, Manganelli, Costanza Lucia, Zatterin, Edoardo, Spirito, Davide, Marzegalli, Anna, Schulli, Tobias, Von Den Driesch, Nils, Buca, Dan, Montalenti, Francesco, Richter, Carsten, Capellini, Giovanni

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Threading Dislocation Reduction of Ge by Introducing a SiGe/Ge Superlattice von Yamamoto, Yuji, Corley, Cedric, Schubert, Markus Andreas, Zöllner, Marvin, Tillack, Bernd

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Subnanometer Control of the Heteroepitaxial Growth of Multimicrometer-Thick Ge / Si - Ge Quantum Cascade Structures von Talamas Simola, Enrico, Montanari, Michele, Corley-Wiciak, Cedric, Di Gaspare, Luciana, Persichetti, Luca, Zöllner, Marvin H., Schubert, Markus A., Venanzi, Tommaso, Trouche, Marina Cagnon, Ortolani, Michele, Mattioli, Francesco, Sfuncia, Gianfranco, Nicotra, Giuseppe, Capellini, Giovanni, Virgilio, Michele, De Seta, Monica

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(Invited) Nickel and Nickel-Platinum Silicide for BiCMOS Devices von Wolansky, Dirk, Blaschke, Jean-Paul, Drews, Jürgen, Grabolla, Thomas, Heinemann, Bernd, Lenke, Thomas, Rücker, Holger, Schubert, Markus Andreas, Schulze, Sebastian, Stoll, Heinz-Peter, Zöllner, Marvin, Richter, Uwe, Deyo, Dan

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n-type Ge/SiGe Multi Quantum-Wells for a THz Quantum Cascade Laser von Ciano, Chiara, Di Gaspare, Luciana, Montanari, Michele, Persichetti, Luca, Baldassarre, Leonetta, Ortolani, Michele, Capellini, Giovanni, Skibitzki, Oliver, Zöllner, Marvin, Faist, Jerome, Scalari, Giacomo, Stark, David, Paul, Douglas J, Rew, Kirsty, Moutanabbir, Oussama, Mukherjee, Samik, Grange, Thomas, Birner, Stefan, Virgilio, Michele, De Seta, Monica

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3-Dimensional Self-Ordered Multilayered Ge Nanodots on SiGe von Wen, Wei-Chen, Schubert, Markus Andreas, Zöllner, Marvin Hartwig, Tillack, Bernd, Yamamoto, Yuji

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Threading Dislocation Reduction of Ge by Introducing a SiGe/Ge Superlattice von Yamamoto, Yuji, Corley, Cedric, Schubert, Markus Andreas, Zöllner, Marvin, Tillack, Bernd

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N-Type Ge/SiGe Multi-Quantum Wells for THz Light Emission: High Quality Growth and Material Parameter Calibration von Persichetti, Luca, Ciano, Chiara, Montanari, Michele, Baldassarre, Leonetta, Di Gaspare, Luciana, Pashkin, Alexej, Helm, Manfred, Skibitzki, Oliver, Zöllner, Marvin, Capellini, Giovanni, Ortolani, Michele, Virgilio, Michele, De Seta, Monica

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(Invited) Nickel and Nickel-Platinum Silicide for BiCMOS Devices von Wolansky, Dirk, Blaschke, Jean-Paul, Drews, Jürgen, Grabolla, Thomas, Heinemann, Bernd, Lenke, Thomas, Rücker, Holger, Schubert, Markus Andreas, Schulze, Sebastian, Stoll, Heinz-Peter, Zöllner, Marvin, Richter, Uwe, Deyo, Dan

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SEMICONDUCTOR WAFER COMPRISING A MONOCRYSTALLINE GROUP-IIIA NITRIDE LAYER von THAPA, Sarad Bahadur, SCHRÖDER, Thomas, ZÖLLNER, Marvin, HÄBERLEN, Maik

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SEMICONDUCTOR WAFER COMPRISING A MONOCRYSTALLINE GROUP-IIIA NITRIDE LAYER von THAPA, Sarad Bahadur, SCHRÖDER, Thomas, ZÖLLNER, Marvin, HÄBERLEN, Maik

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