SiGe Selective Etching to Enable Bottom and Middle Dielectric Isolations for Advanced Gate-All-Around FET Architecture von Liu, Wen, Altamirano-Sanchez, Efrain, Nakano, Teppei, Chen, Jason, Sebaai, Farid, Lai, Ju Geng, Tanaka, Takayoshi, Wu, Ai Ping, Ishizu, Takaaki, Kawashima, Tomohiko, Yusuke, Oniki, Kawarazaki, Hikaru

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Evaluation of GeO desorption behavior in the metal/GeO2/Ge structure and its improvement of the electrical characteristics von Oniki, Yusuke, Koumo, Hideo, Iwazaki, Yoshitaka, Ueno, Tomo

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Generation and Controlling the Trap in Absorbent Germanium Oxide Film von Oniki, Yusuke, Ueno, Tomo

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Water-Related Hole Traps at Thermally Grown GeO2--Ge Interface von Oniki, Yusuke, Ueno, Tomo

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Effects of Structural Transformation of Metal-GeO2 Interface on Electrical Properties von Koumo, Hideo, Oniki, Yusuke, Iwazaki, Yoshitaka, Ueno, Tomo

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Water-Related Hole Traps at Thermally Grown GeO 2 –Ge Interface von Oniki, Yusuke, Ueno, Tomo

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Study on La 2 O 3 Wet Clean by pH Controlled Functional Water von Ogawa, Yuichi, Hideaki, Iino, Takeo, Fukui, Oniki, Yusuke, Akanishi, Yuya, Altamirano-Sánchez, Efraín, Holsteyns, Frank

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Si1-XGeX Selective Etchant for Gate-All-Around Transistors von Harada, Ken, Kusano, Tomohiro, Oniki, Yusuke, Takeshita, Kan, Altamirano-Sanchez, Efrain, Holsteyns, Frank, Suzuki, Tatsunobu, Struyf, Herbert

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Challenges and Solutions of Replacement Metal Gate Patterning to Enable Gate-all-Around Device Scaling von Dekkers, Harold, Chan, Boon Teik, Oniki, Yusuke, Ragnarsson, Lars Åke, Altamirano-Sanchez, Efrain, Holsteyns, Frank, Horiguchi, Naoto, Sebaai, Farid, Dentoni Litta, Eugenio, Cott, Daire, Iino, Hideaki, Hopf, Toby

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RMG Patterning by Digital Wet Etching of Polycrystalline Metal Films von Holsteyns, Frank, Oniki, Yusuke, Vereecke, Guy, Dekkers, Harold, Ragnarsson, Lars Åke, Schram, Tom, Dentoni Litta, Eugenio, Horiguchi, Naoto

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Optimization of Post Etch Cobalt Compatible Clean by pH and Oxidizer von Rip, Jens, Holsteyns, Frank, Iwasaki, Akihisa, Le, Quoc Toan, Ogawa, Yuichi, Masaoka, Toru, Oniki, Yusuke, Iino, Hideaki, Kesters, Els, Akanishi, Yuya

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Novel histone deacetylase inhibitors: cyclic tetrapeptide with trifluoromethyl and pentafluoroethyl ketones von JOSE, Binoy, ONIKI, Yusuke, KATO, Tamaki, NISHINO, Norikazu, SUMIDA, Yuko, YOSHIDA, Minoru

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Fabrication of High-k/Ge Stacks with High Quality GeO 2 Interlayer von Suzuki, Yuya, Oniki, Yusuke, Iwazaki, Yoshitaka, Ueno, Tomo

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Achievement of Excellent C-V Characteristics in GeO 2 /Ge System Using Post Metal Deposition Annealing von Koumo, Hideo, Suzuki, Yuya, Oniki, Yusuke, Iwazaki, Yoshitaka, Ueno, Tomo

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Method for forming semiconductor structure with contact over source/drain structure von Kelly, Andrew Joseph, Oniki, Yusuke

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Semiconductor device and manufacturing method thereof von Ohtou, Tetsu, Oniki, Yusuke

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SEMICONDUCTOR INTEGRATED CIRCUIT von CHOU, You-Hua, ONIKI, Yusuke, CHUANG, Kuo-Sheng

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METHOD FOR FORMING SEMICONDUCTOR STRUCTURE WITH CONTACT OVER SOURCE/DRAIN STRUCTURE von KELLY, Andrew Joseph, ONIKI, Yusuke

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Semiconductor integrated circuit von Chuang, Kuo-Sheng, Chou, You-Hua, Oniki, Yusuke

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Method for forming semiconductor structure with contact over source/drain structure von Kelly, Andrew Joseph, Oniki, Yusuke

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