Deposition of TiAlN Thin Films by Magnetron Discharge Plasma von Fedorov, A. I., Yurjev, Yu. N., Kazimirov, A. I., Yurjeva, A. V.

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Study on Optical and Photocatalytic Properties of Titanium Oxide Thin Films with Various Oxidation Degrees von Ruchkin, S. E., Zhidik, Yu. S., Yurjev, Yu. N., Runts, A. A., Goncharova, E. D., Yurjeva, A. V.

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Magnetron Sputtering Deposition of Intermetallic Coatings Using Tin and Niobium Plasma von Yurjev, Yu. N., Kharisova, A. E., Selezneva, T. V., Savelev, A. I., Kazimirov, A. I.

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Superconductive Nb3Sn Coatings Synthesized for Charged-Particle Accelerators Using Magnetron Sputtering von Yurjev, Yu. N., Bordulev, Yu. S., Kharisova, A. E., Selezneva, T. V., Savelev, A. I., Kazimirov, A. I.

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The investigation of properties of silicon nitride films obtained by RPECVD from hexamethyldisilazane von Fainer, N.I., Rumyantsev, Yu.M., Kosinova, M.L., Yurjev, G.S., Maximovskii, E.A., Kuznetsov, F.A.

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The structure study of thin boron and silicon carbonitride films by diffraction of synchrotron radiation von Fainer, N.I, Kosinova, M.L, Yurjev, G.S, Maximovski, E.A, Rumyantsev, Yu.M, Asanov, I.P

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The structure study of thin cadmium and copper sulphide films by diffraction of synchrotron radiation von Fainer, N.I., Rumyantsev, Yu.M., Kosinova, M.L., Zemskova, S.M., Maximovskiy, E.A., Yurjev, G.S., Sivykh, G.F.

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The structure study of thin semiconductor and dielectric films by diffraction of synchrotron radiation von Yurjev, G.S., Fainer, N.I., Maximovskiy, E.A., Kosinova, M.L., Sheromov, M.A., Rumyantsev, Yu.M.

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Plasma-deposited CdS layers from (o-phen) bis (diethyldithiocarbamate) cadmium von Fainer, N.I, Rumyantsev, Yu.M, Salman, E.G, Kosinova, M.L, Yurjev, G.S, Sysoeva, N.P, Maximovskii, E.A, Sysoev, S.V, Golubenko, A.N

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The investigation of properties of silicon nitride films obtained by RPECVD from hexamethyldisilazane von FAINER, N. I, RUMYANTSEV, YU. M, KOSINOVA, M. L, YURJEV, G. S, MAXIMOVSKII, E. A, KUZNETSOV, F. A

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