Behavior of Lamellar Forming Block Copolymers under Nanoconfinement: Implications for Topography Directed Self-Assembly of Sub-10 nm Structures von Keen, Imelda, Cheng, Han-Hao, Yu, Anguang, Jack, Kevin S, Younkin, Todd R, Leeson, Michael J, Whittaker, Andrew K, Blakey, Idriss

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Tuning the Kinetics and Energetics of Diels−Alder Cycloaddition Reactions to Improve Poling Efficiency and Thermal Stability of High-Temperature Cross-Linked Electro-Optic Polymers... von Shi, Zhengwei, Liang, Wenkel, Luo, Jingdong, Huang, Su, Polishak, Brent M, Li, Xiaosong, Younkin, Todd R, Block, Bruce A, Jen, Alex K.-Y

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Catalytic and Autocatalytic Mechanisms of Acid Amplifiers for Use in EUV Photoresists von Kruger, Seth A, Higgins, Craig, Cardineau, Brian, Younkin, Todd R, Brainard, Robert L

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Electro-optic polymer cladding ring resonator modulators von Block, Bruce A, Younkin, Todd R, Davids, Paul S, Reshotko, Miriam R, Chang, Peter, Polishak, Brent M, Huang, Su, Luo, Jingdong, Jen, Alex K Y

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Patterning of Tailored Polycarbonate Based Non-Chemically Amplified Resists Using Extreme Ultraviolet Lithography von Yu, Anguang, Liu, Heping, Blinco, James P., Jack, Kevin S., Leeson, Michael, Younkin, Todd R., Whittaker, Andrew K., Blakey, Idriss

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Evidence of speckle in extreme-UV lithography von Pret, Alessandro Vaglio, Gronheid, Roel, Engelen, Jan, Yan, Pei-Yang, Leeson, Michael J, Younkin, Todd R

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Fluorinated Acid Amplifiers for EUV Lithography von Kruger, Seth, Revuru, Sri, Higgins, Craig, Gibbons, Sarah, Freedman, Daniel A, Yueh, Wang, Younkin, Todd R, Brainard, Robert L

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Time Dependent Behavior of Chemically Amplified Resist Characterized under Sub-millisecond Post Exposure Bake von Jung, Byungki, Chandhok, Manish, Younkin, Todd R., Ober, Christopher K., Thompson, Michael O.

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Neutral, Single-Component Nickel (II) Polyolefin Catalysts That Tolerate Heteroatoms von Younkin, Todd R., Connor, Eric F., Henderson, Jason I., Friedrich, Stefan K., Grubbs, Robert H., Bansleben, Donald A.

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Readying Directed Self-Assembly for Patterning in Semi-Conductor Manufacturing von Gronheid, Roel, Delgadillo, Paulina Rincon, Singh, Arjun, Younkin, Todd R., Suyan, Safak, Chan, Boon Teik, Look, Lieve Van, Bekaert, Joost, Pollentir, Ivan, Nealey, Paul F.

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Mask Effects on Resist Variability in Extreme Ultraviolet Lithography von Pret, Alessandro Vaglio, Gronheid, Roel, Engelen, Jan, Yan, Pei-Yang, Leeson, Michael J, Younkin, Todd R, Garidis, Konstantinos, Biafore, John

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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers von Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., Whittaker, Andrew K.

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Kinetic Rates of Thermal Transformations and Diffusion in Polymer Systems Measured during Sub-millisecond Laser-Induced Heating von Jung, Byungki, Sha, Jing, Paredes, Florencia, Chandhok, Manish, Younkin, Todd R, Wiesner, Ulrich, Ober, Christopher K, Thompson, Michael O

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High resolution negative tone molecular resist based on di-functional epoxide polymerization von Lawson, Richard A., Lee, Cheng-Tsung, Tolbert, Laren M., Younkin, Todd R., Henderson, Clifford L.

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Reinforced Site Isolation Leading to Remarkable Thermal Stability and High Electrooptic Activities in Cross-Linked Nonlinear Optical Dendrimers von Shi, Zhengwei, Luo, Jingdong, Huang, Su, Zhou, Xing-Hua, Kim, Tae-Dong, Cheng, Yen-Ju, Polishak, Brent M, Younkin, Todd R, Block, Bruce A, Jen, Alex K.-Y

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Neutral Nickel(II)-Based Catalysts for Ethylene Polymerization von Wang, Chunming, Friedrich, Stefan, Younkin, Todd R, Li, Robert T, Grubbs, Robert H, Bansleben, Donald A, Day, Michael W

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EUV Resist Testing Status and Post Lithography LWR Reduction von Vandentop, Gilroy J., Putna, E. Steve, Leeson, Micahel J., Younkin, Todd R., Kloster, Grant M., Shah, Uday, Chandhok, Manish

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Synthesis of neutral nickel catalysts for ethylene polymerization--the influence of ligand size on catalyst stability von Connor, Eric F, Younkin, Todd R, Henderson, Jason I, Waltman, Andrew W, Grubbs, Robert H

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Insights into the Deactivation of Neutral Nickel Ethylene Polymerization Catalysts in the Presence of Functionalized Olefins von Waltman, Andrew W, Younkin, Todd R, Grubbs, Robert H

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Controlled Diels−Alder Reactions Used To Incorporate Highly Efficient Polyenic Chromophores into Maleimide-Containing Side-Chain Polymers for Electro-Optics von Shi, Zhengwei, Luo, Jingdong, Huang, Su, Cheng, Yen-Ju, Kim, Tae-Dong, Polishak, Brent M, Zhou, Xing-Hua, Tian, Yanqing, Jang, Sei-Hum, Knorr, Jr, Daniel B, Overney, René M, Younkin, Todd R, Jen, Alex K.-Y

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