SET/CMOS hybrid process and multiband filtering circuits von SONG, Ki-Whan, YONG KYU LEE, JAE SUNG SIM, JEOUNG, Hoon, JONG DUK LEE, PARK, Byung-Gook, YOU SEUNG JIN, KIM, Young-Wug

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Thermal stability of atomic-layer-deposited HfO2 thin films on the SiNx-passivated Si substrate von Cho, Moonju, Park, Jaehoo, Park, Hong Bae, Hwang, Cheol Seong, Jeong, Jaehack, Hyun, Kwang Soo, Kim, Young-Wug, Oh, Chang-Bong, Kang, Hee-Sung

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Application of high pressure deuterium annealing for improving the hot carrier reliability of CMOS transistors von Jinju Lee, Kangguo Cheng, Zhi Chen, Hess, K., Lyding, J.W., Young-Kwang Kim, Hyui-Seung Lee, Young-Wug Kim, Kwang-Pyuk Suh

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Ultrathin gate oxide grown on nitrogen-implanted silicon for deep submicron CMOS transistors von Nam, In-Ho, Sim, Jae Sung, Hong, Sung In, Park, Byung-Gook, Lee, Jong Duk, Lee, Seung-Woo, Kang, Man-Sug, Kim, Young-Wug, Suh, Kwang-Pyuk, Lee, Won Seong

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A 0.25-μm, 600-MHz, 1.5-V, fully depleted SOI CMOS 64-bit microprocessor von Park, Sung Bae, Kim, Young Wug, Ko, Young Gun, Kim, Kwang Il, Kim, Il Kwon, Kang, Hee-Sung, Yu, Jin Oh, Suh, Kwang Pyuk

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Improved hot-carrier reliability of SOI transistors by deuterium passivation of defects at oxide/silicon interfaces von Kangguo Cheng, Jinju Lee, Karl, H., Lyding, J.W., Young-Kwang Kim, Young-Wug Kim, Kwang-Pyuk Suh

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Complementary Self-Biased Logics Based on Single-Electron Transistor (SET)/CMOS Hybrid Process von Song, Ki-Whan, Lee, Yong Kyu, Sim, Jae Sung, Kim, Kyung Rok, Lee, Jong Duk, Park, Byung-Gook, You, Young Sub, Park, Joo-On, Jin, You Seung, Kim, Young-Wug

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Separation of hot-carrier-induced interface trap creation and oxide charge trapping in PMOSFETs studied by hydrogen/deuterium isotope effect von Cheng, K., Lee, J., Lyding, J.W., Young-Kwang Kim, Young-Wug Kim, Kuang Pyuk Suh

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An alternative interpretation of hot electron interface degradation in NMOSFETs: isotope results irreconcilable with major defect generation by holes? von Hess, K., Jinju Lee, Zhi Chen, Lyding, J.W., Young-Kwang Kim, Bong-Seok Kim, Yong-Hee Lee, Young-Wug Kim, Kwang-Pyuk Suh

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Application of in-situ Al-flow process for triple-level metallization von LEE, K.-Y, LEE, S.-C, KIM, Y.-W

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Effect of the silicidation reaction condition on the gate oxide integrity in Ti-polycide gate von NAE-IN LEE, YOUNG-WUG KIM, SUNG TAE AHN

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Multilevel vertical-channel SONOS nonvolatile memory on SOI von Lee, Yong Kyu, Sim, Jae Sung, Sung, Suk Kang, Lee, Chang Ju, Kim, Tae Hun, Lee, Jong Duk, Park, Byung Gook, Lee, Dong Hun, Kim, Young Wug

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Fully Depleted SOI Complementary MOS Device with Raised Source/Drain for 90 nm Embedded Static RAM Technology von Park, Chang Hyun, Oh, Myung Hwan, Kang, Hee Sung, Oh, Chang Bong, Jung, Mu Kyeng, Kim, Young Wug

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Deuterium pressure dependence of characteristics and hot-carrier reliability of CMOS devices von Cheng, Kangguo, Lee, Jinju, Chen, Zhi, Shah, Samir, Hess, Karl, Lyding, Joseph W., Kim, Young-Kwang, Kim, Young-Wug, Suh, Kuwang Pyuk

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Integrated LC VCO Compatible with Memory Process for Gigahertz Clock Generation von Minseok Choi, Youngho Jung, Yeo Jo Yoon, Young-Wug Kim, Hyungcheol Shin

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The influence of Cu Diffusion on NMOS Device Characteristics von Mu-Kyeung, Jung, Seong-Ho, Liu, Jong-Hyon, Ahn, Kyung-Tae, Lee, Hee-Sung, Kang, Young-Wug, Kim, Kwang-Pyuk, Suh

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The effect of body contact arrangement on thin SOI MOSFET characteristics von Oh, Chang-Bong, Ahn, Jonghyon, Kim, Young-Wug

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Nitrogen profile effects on the growth rate of gate oxides grown on nitrogen-implanted silicon von Nam, In-Ho, Hong, Sung In, Sim, Jae Sung, Park, Byung-Gook, Lee, Jong Duk, Lee, Seung-Woo, Kang, Man-Suk, Kim, Young-Wug, Suh, Kwang-Pyuk, Lee, Won-Seong

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Improved current performance of CMOSFETs with nitrogen incorporated HfO2-Al2O3 laminate gate dielectric von Hyung-Seok Jung, Yun-Seok Kim, Jong Pyo Kim, Jung Hyoung Lee, Jong-Ho Lee, Nae-In Lee, Ho-Kyu Kang, Kwang-Pyuk Suh, Hyuk Ju Ryu, Chang-Bong Oh, Young-Wug Kim, Kyung-Hwan Cho, Hion-Suck Baik, Young Su Chung, Hyo Sik Chang, Dae Won Moon

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Integration of MIM capacitors with low-k/Cu process for 90 nm analog circuit applications von Jeong-Hoon Ahm, Kyung-Tae Lee, Mu-Kyeung Jung, Yong-Jun Lee, Byung-Jun Oh, Seong-Ho Liu, Yoon-Hae Kim, Young-Wug Kim, Kwang-Pyuk Suh

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