On Encapsulated Dielectric Barrier Discharge Plasma Sources for Radar Cross Section Reduction in Mobile Environments von Choi, Minsu, You, Shin-Jae, Jung, Jinwoo, Cho, Changseok, Lee, Yongshik, Kim, Cheonyoung, Ha, Jungje, Lee, Hyunsoo, Seol, Youbin

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Study on characteristics of electron parameters on inert gas addition in a capacitively coupled SF6/O2 plasma von Seol, Youbin, Chang, Hong Young, Ahn, Seung Kyu, You, Shin Jae

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On radar cross section reduction effect by filamentary discharge in a dielectric barrier discharge von Minsu Choi, Shin-Jae You, Jinwoo Jung, Changseok Cho, Yongshik Lee, Cheonyoung Kim, Jungje Ha, Hyunsoo Lee, Youbin Seol

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Axillary root development triggered by cold plasma treatment von Choi, Bae Young, Seol, Youbin, Kim, Jaewook

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Study on OH Radical Production Depending on the Pulse Characteristics in an Atmospheric-Pressure Nanosecond-Pulsed Plasma Jet von Seol, Youbin, Choi, Minsu, Chang, Hongyoung, You, Shinjae

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Effect of mixing CF4 with O2 on electron characteristics of capacitively coupled plasma von Seol, Youbin, Chang, Hong Young, Ahn, Seung Kyu, You, Shin Jae

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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Contro... von Jeong, Wonnyoung, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, You, Yebin, Choi, Minsu, Lee, Jangjae, Seol, Youbin, You, Shinjae

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Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma von Seong, Inho, Kim, Sijun, Choi, Minsu, Lee, Woobeen, Jeong, Wonnyoung, Cho, Chulhee, You, Yebin, Lee, Youngseok, Seol, Youbin, You, Shinjae

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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO 2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C 4 F 8 Plasma: Individual Ion Energy and Flux Co... von Jeong, Wonnyoung, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, You, Yebin, Choi, Minsu, Lee, Jangjae, Seol, Youbin, You, Shinjae

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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO[sub.2] Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C[sub.4]F[sub.8] Plasma: Individual Ion Ener... von Jeong, Wonnyoung, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, You, Yebin, Choi, Minsu, Lee, Jangjae, Seol, Youbin, You, Shinjae

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Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction von Choi, Minsu, Lee, Youngseok, You, Yebin, Cho, Chulhee, Jeong, Wonnyoung, Seong, Inho, Choi, Byeongyeop, Kim, Sijun, Seol, Youbin, You, Shinjae, Yeom, Geun Young

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Characterization of SiO[sub.2] Plasma Etching with Perfluorocarbon Precursors for the Greenhouse Gas Emissions Reduction von Choi, Minsu, Lee, Youngseok, You, Yebin, Cho, Chulhee, Jeong, Wonnyoung, Seong, Inho, Choi, Byeongyeop, Kim, Sijun, Seol, Youbin, You, Shinjae, Yeom, Geun Young

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