Study on OH Radical Production Depending on the Pulse Characteristics in an Atmospheric-Pressure Nanosecond-Pulsed Plasma Jet von Seol, Youbin, Choi, Minsu, Chang, Hongyoung, You, Shinjae

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Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas von Cho, Chulhee, You, Kwangho, Kim, Sijun, Lee, Youngseok, Lee, Jangjae, You, Shinjae

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Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2 von Lee, Youngseok, Kim, Sijun, Lee, Jangjae, Cho, Chulhee, Seong, Inho, You, Shinjae

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Compensation of Heat Effect in Dielectric Barrier Discharge (DBD) Plasma System for Radar Cross-Section (RCS) Reduction von Jung, Jinwoo, Cho, Changseok, Choi, Minsu, You, Shinjae, Ha, Jungje, Lee, Hyunsoo, Kim, Cheonyoung, Oh, Ilyoung, Lee, Yongshik

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Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath von Seong, Inho, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Lee, Jangjae, Jeong, Wonnyoung, You, Yebin, You, Shinjae

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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Contro... von Jeong, Wonnyoung, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Seong, Inho, You, Yebin, Choi, Minsu, Lee, Jangjae, Seol, Youbin, You, Shinjae

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Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma von Seong, Inho, Kim, Sijun, Choi, Minsu, Lee, Woobeen, Jeong, Wonnyoung, Cho, Chulhee, You, Yebin, Lee, Youngseok, Seol, Youbin, You, Shinjae

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Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method von Cho, Chulhee, Kim, Sijun, Lee, Youngseok, Seong, Inho, Jeong, Wonnyoung, You, Yebin, Choi, Minsu, You, Shinjae

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Plasma Generator with Dielectric Rim and FSS Electrode for Enhanced RCS Reduction Effect von Oh, Taejoo, Cho, Changseok, Ahn, Wookhyun, Yook, Jong-Gwan, Lee, Jangjae, You, Shinjae, Yim, Jinwoo, Ha, Jungje, Bae, Gihun, You, Heung-Cheol, Lee, Yongshik

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A unified global model accompanied with a voltage and current sensor for low-pressure capacitively coupled RF discharge von Seong, Inho, Kim, Sijun, Lee, Woobeen, Lee, Youngseok, Cho, Chulhee, Jeong, Wonnyoung, Choi, Minsu, Choi, Byeongyeop, Seo, Huichan, Song, Sangheon, You, Shinjae

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Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma von Cho, Chulhee, Kim, Sijun, Lee, Youngseok, Jeong, Wonnyoung, Seong, Inho, Lee, Jangjae, Choi, Minsu, You, Yebin, Lee, Sangho, Lee, Jinho, You, Shinjae

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Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction von Choi, Minsu, Lee, Youngseok, You, Yebin, Cho, Chulhee, Jeong, Wonnyoung, Seong, Inho, Choi, Byeongyeop, Kim, Sijun, Seol, Youbin, You, Shinjae, Yeom, Geun Young

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Investigation of reliability of the cutoff probe by a comparison with Thomson scattering in high density processing plasmas von Seo, Byonghoon, Kim, Dae-Woong, Kim, Jung-Hyung, You, Shinjae

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On the Quenching of Electron Temperature in Inductively Coupled Plasma von Seong, Inho, Kim, Si-Jun, Lee, Youngseok, Cho, Chulhee, Jeong, Wonnyoung, You, Yebin, Choi, Minsu, Choi, Byeongyeop, You, Shinjae

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Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe von Lee, Youngseok, Yeom, Heejung, Choi, Daehan, Kim, Sijun, Lee, Jangjae, Kim, Junghyung, Lee, Hyochang, You, ShinJae

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Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma von Seong, Inho, Lee, Jinho, Kim, Sijun, Lee, Youngseok, Cho, Chulhee, Lee, Jangjae, Jeong, Wonnyoung, You, Yebin, You, Shinjae

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Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO2 Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing von Lee, Youngseok, You, Yebin, Cho, Chulhee, Kim, Sijun, Lee, Jangjae, Kim, Minyoung, Lee, Hanglim, You, Youngjun, Kim, Kyungman, You, ShinJae

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Dielectric Patterning Method for Enhanced Monostatic Radar Cross Section (RCS) Reduction Effect Based on Dielectric-Barrier Discharge (DBD) Plasma von Jung, Jinwoo, Cho, Changseok, Choi, Minsu, Ha, Jungje, You, Shinjae, Lee, Hyunsoo, Kim, Cheonyoung, Oh, Ilyoung, Lee, Yongshik

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Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2 von Lee, Youngseok, Seong, Inho, Lee, Jangjae, Lee, Sangho, Cho, Chulhee, Kim, Sijun, You, ShinJae

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Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6) von Seong, Inho, You, Yebin, Lee, Youngseok, Choi, Minsu, Sung, Dain, Yeom, Geunyoung, You, ShinJae

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