High Pulse-Energy Green Laser for Laser Annealing System by LD-pumped Nd:YAG Laser von IZAWA, Jun, MATSUZAKA, Fumio, NISHIDA, Kenichirou, KAWAKAMI, Ryuusuke, KAWAGUCHI, Norihito, MASAKI, Miyuki, MORITA, Masaru, YOSHINOUCHI, Atsushi, ODAGIRI, Kiyoyuki, KAWASAKI, Yoshinori

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Orientation Dependence of Silicon Oxidation Ratio in High-Pressure Water Vapor von Yamamoto, Naoya, Oshita, Yoshio, Ogura, Atsushi, Yoshinouchi, Atsushi

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Formation of Sources/Drains Using Self-Activation Technique on Polysilicon Thin Film Transistors von Yoshinouchi, Atsushi, Oda, Akihiro, Murata, Yasuaki, Tatsuo Morita, Tatsuo Morita, Shuhei Tsuchimoto, Shuhei Tsuchimoto

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Improvement in Characteristics of Thin Film Transistors upon High-Pressure Steam Annealing von Yamamoto, Naoya, Watanabe, Tomoyuki, Masaki, Miyuki, Kawakami, Ryusuke, Murayama, Takahiko, Ohshita, Yoshio, Ogura, Atsushi, Yoshinouchi, Atsushi

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Fabrication of self-aligned aluminum gate polysilicon thin-film transistors using low-temperature crystallization process von OHNO, E, YOSHINOUCHI, A, HOSODA, T, ITOH, M, MORITA, T, TSUCHIMOTO, S

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Pulsed Green-Laser Annealing for Single-Crystalline Silicon Film Transferred onto Silicon wafer and Non-alkaline Glass by Hydrogen-Induced Exfoliation von Kawaguchi, Norihito, Kawakami, Ryusuke, Nishida, Ken-ichiro, Yamamoto, Naoya, Masaki, Miyuki, Yoshinouchi, Atsushi

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High Pulse-Energy Green Laser for Laser Annealing System by LD-pumped Nd von IZAWA, Jun, MATSUZAKA, Fumio, NISHIDA, Kenichirou, KAWAKAMI, Ryuusuke, KAWAGUCHI, Norihito, MASAKI, Miyuki, MORITA, Masaru, YOSHINOUCHI, Atsushi, ODAGIRI, Kiyoyuki, KAWASAKI, Yoshinori

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Light ion beam transport in a multi-plasma channel system von OZAKI, T, YOSHINOUCHI, A, IMASAKI, K, MIYAMOTO, S, NAKAI, S, YAMANAKA, C

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METHOD OF FORMING INTER-DEVICE ISOLATING REGION von YOSHINOUCHI ATSUSHI, WATANABE TOMOYUKI

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Characteristics of intense ion beam in pinch reflex diode von YOSHINOUCHI, A, OZAKI, T, MIYAMOTO, S, IMASAKI, K, NAKAI, S, YAMANAKA, C

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Method for manufacturing semiconductor device von YOSHINOUCHI ATSUSHI, WATANABE TOMOYUKI

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Method for manufacturing semiconductor device von Watanabe, Tomoyuki, Yoshinouchi, Atsushi

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LASER ANNEALING METHOD AND DEVICE von MASAKI MIYUKI, YOSHINOUCHI ATSUSHI, KAWAGUCHI NORIHITO, NISHIDA KENICHIRO, KAWAKAMI RYUSUKE

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Method For Manufacturing Semiconductor Device von YOSHINOUCHI ATSUSHI, WATANABE TOMOYUKI

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Laser annealing method and device von NISHIDA KENICHIROU, MASAKI MIYUKI, YOSHINOUCHI ATSUSHI, KAWAGUCHI NORIHITO, KAWAKAMI RYUSUKE

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Verfahren zum Herstellen einer Halbleitervorrichtung von YOSHINOUCHI, ATSUSHI, WATANABE, TOMOYUKI

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THIN FILM TRANSISTOR, ITS MANUFACTURING METHOD AND LIQUID CRYSTAL DISPLAY DEVICE von YOSHINOUCHI ATSUSHI

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METHOD FOR FORMING SEMICONDUCTOR FILM von YOSHINOUCHI ATSUSHI

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HEATER von YOSHINOUCHI ATSUSHI

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HEATER von YOSHINOUCHI ATSUSHI

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