Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning von Yogesh, Midathala, Moinuddin, Mohamad. G, Chauhan, Manvendra, Sharma, Satinder K, Ghosh, Subrata, Gonsalves, Kenneth E

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Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies von Choudhary, Sumit, Yogesh, Midathala, Schwarz, Daniel, Funk, Hannes S., Ghosh, Subrata, Sharma, Satinder K., Schulze, Jörg, Gonsalves, Kenneth E.

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Organotin bearing polymeric resists for electron beam lithography von Yogesh, Midathala, Moinuddin, Mohamad G., Khillare, Lalit D., Chinthalapalli, Srinivas, Sharma, Satinder K., Ghosh, Subrata, Gonsalves, Kenneth E.

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Functionalized Ag Nanoparticles Embedded in Polymer Resists for High-Resolution Lithography von Moinuddin, Mohamad G, Kumar, Rudra, Yogesh, Midathala, Sharma, Shivani, Sahani, Manoj, Sharma, Satinder K, Gonsalves, Kenneth E

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New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning von Thakur, Neha, Reddy, Pulikanti Guruprasad, Nandi, Santu, Yogesh, Midathala, Sharma, Satinder K, Pradeep, Chullikkattil P, Ghosh, Subrata, Gonsalves, Kenneth E

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A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential von Nandi, Santu, Yogesh, Midathala, Reddy, Pulikanti Guruprasad, Sharma, Satinder K., Pradeep, Chullikkattil P., Ghosh, Subrata, Gonsalves, Kenneth E.

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A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potentialElectronic supplementary information (ESI) a... von Nandi, Santu, Yogesh, Midathala, Reddy, Pulikanti Guruprasad, Sharma, Satinder K, Pradeep, Chullikkattil P, Ghosh, Subrata, Gonsalves, Kenneth E

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