Interface formation in W/Si multilayers studied by Low Energy Ion Scattering von Zameshin, A.A., Medvedev, R.V., Yakshin, A.E., Bijkerk, F.

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Nanometer interface and materials control for multilayer EUV-optical applications von Louis, E., Yakshin, A.E., Tsarfati, T., Bijkerk, F.

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Wideband multilayer mirrors with minimal layer thicknesses variation von Kozhevnikov, I V, Yakshin, A E, Bijkerk, F

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Post deposition nitridation of Si in W/Si soft X-ray multilayer systems von Medvedev, R.V., Hendrikx, C.P., Sturm, J.M., Yakunin, S.N., Makhotkin, I.A., Yakshin, A.E., Bijkerk, F.

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Subwavelength single layer absorption resonance antireflection coatings von Huber, S P, van de Kruijs, R W E, Yakshin, A E, Zoethout, E, Boller, K-J, Bijkerk, F

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Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors von Medvedev, V V, van den Boogaard, A J R, van der Meer, R, Yakshin, A E, Louis, E, Krivtsun, V M, Bijkerk, F

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Interactions of C in layered Mo–Si structures von Bosgra, J., Veldhuizen, L.W., Zoethout, E., Verhoeven, J., Loch, R.A., Yakshin, A.E., Bijkerk, F.

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In-situ study of the diffusion-reaction mechanism in Mo/Si multilayered films von Bruijn, S., van de Kruijs, R.W.E., Yakshin, A.E., Bijkerk, F.

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Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection von de Rooij-Lohmann, V.I.T.A., Yakshin, A.E., Zoethout, E., Verhoeven, J., Bijkerk, F.

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Non-constant diffusion characteristics of nanoscopic Mo–Si interlayer growth von Bosgra, J., Verhoeven, J., van de Kruijs, R.W.E., Yakshin, A.E., Bijkerk, F.

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Phosphorus-based compounds for EUV multilayer optics materials von Medvedev, V.V., Yakshin, A.E., van de Kruijs, R.W.E., Bijkerk, F.

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Thermally induced decomposition of B4C barrier layers in Mo/Si multilayer structures von Bruijn, S., van de Kruijs, R.W.E., Yakshin, A.E., Zoethout, E., Bijkerk, F.

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Roughness evolution of Si surfaces upon Ar ion erosion von de Rooij-Lohmann, V.I.T.A., Kozhevnikov, I.V., Peverini, L., Ziegler, E., Cuerno, R., Bijkerk, F., Yakshin, A.E.

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Nano-size crystallites in Mo/Si multilayer optics von van de Kruijs, R.W.E., Zoethout, E., Yakshin, A.E., Nedelcu, I., Louis, E., Enkisch, H., Sipos, G., Müllender, S., Bijkerk, F.

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Interface roughness in Mo/Si multilayers von Nedelcu, I., van de Kruijs, R.W.E., Yakshin, A.E., Tichelaar, F., Zoethout, E., Louis, E., Enkisch, H., Muellender, S., Bijkerk, F.

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Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing von Dobrovolskiy, S., Yakshin, A.E., Tichelaar, F.D., Verhoeven, J., Louis, E., Bijkerk, F.

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Growth of silicon nitride films by bombarding amorphous silicon with N+ ions: MD simulation von Gou, F., Gleeson, M.A., Kleyn, A.W., Kruijs, R.W.E. van de, Yakshin, A.E., Bijkerk, F.

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The Effect of Mo Crystallinity on Diffusion through the Si-on-Mo Interface in EUV Multilayer Systems von van de Kruijs, R.W.E., Yakshin, A.E., Bijkerk, F., Bruijn, S.

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The application of energetic ions to form a Si/SiC multilayer system for reflection of radiation between 20 and 80nm von Dobrovolskiy, S., Yakshin, A.E., Kessels, M.J.H., Verhoeven, J.

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Determination of the layered structure in Mo/Si multilayers by grazing incidence X-ray reflectometry von Yakshin, A.E, Louis, E, Görts, P.C, Maas, E.L.G, Bijkerk, F

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