X-ray mask fabrication process using Cr mask and ITO stopper in the dry etching of W absorber von FUJINO, T, SASAKI, K, MARUMOTO, K, YABE, H, YOSHIOKA, N, WATAKABE, Y

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Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process von Hosono, Kunihiro, Nagamura, Yoshikazu, Kusunose, Haruhiko, Yoshioka, Nobuyuki, Yaichiro Watakabe, Yaichiro Watakabe, Yoichi Akasaka, Yoichi Akasaka

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Dynamic thermal response of photomasks caused by excimer laser pulse von CHIBA, A, WATAKABE, Y

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Novel Electron Beam Direct Writing Technique for the Hole Pattern of Quarter-Micron Devices von Fujino, Takeshi, Ishii, Atsushi, Kawai, Kenji, Matsuba, Motoko, Nakao, Shuji, Yaichiro Watakabe, Yaichiro Watakabe, Yoichi Akasaka, Yoichi Akasaka

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Fabrication of 0.25-µm Patterns on a Membrane Substrate-Based X-Ray Absorber von Fujino, Takeshi, Hashimoto, Motoko, Yoshioka, Nobuyuki, Moriizumi, Koichi, Satou, Tetsuo, Hiroaki Morimoto, Hiroaki Morimoto, Yaichiro Watakabe, Yaichiro Watakabe

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Sputtered W-Ti Film for X-Ray Mask Absorber von Yabe, Hideki, Marumoto, Kenji, Aya, Sunao, Yoshioka, Nobuyuki, Fujino, Takeshi, Watakabe, Yaichiro, Yasuji Matsui, Yasuji Matsui

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Fine pattern etching of W-Ti absorber for X-ray mask with electron cyclotron resonance discharge plasmas von MARUMOTO, K, YABE, H, AYA, S, MATSUBA, M, SASAKI, K, WATANABE, Y, MATSUI, Y

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Electron Beam Direct Writing Technologies for 0.3-µm ULSI Devices von Moriizumi, Koichi, Takeuchi, Susumu, Fujino, Takeshi, Aoyama, Satoshi, Yoneda, Masahiro, Morimoto, Hiroaki, Watakabe, Yaichiro

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Fabrication of 0.25-μm patterns on a membrane substrate-based X-ray absorber von FUJINO, T, HASHIMOTO, M, YOSHIOKA, N, MORIIZUMI, K, SATOU, T, MORIMOTO, H, WATAKABE, Y

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X-ray lithography using chlorinated polymethylstyrene (CPMS) as a negative X-ray resist von SUZUKI, Y, ISHIO, N, EIMORI, T, YOSHIOKA, N, WATANABE, Y, YAMAZAKI, T

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Stable performance Nb variable thickness microbridge type Josephson junctions: A reproducible fabrication technique von Kodama, Jun-ichi, Hontsu, Shigeki, Hirai, Heihachiro, Oka, Hisao, Kato, Tadao, Watakabe, Yaichiro, Kato, Taka-aki

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JPH0434143B von WATAKABE YAICHIRO

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JPH0434142B von WATAKABE YAICHIRO

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Photomask material von WATAKABE, YAICHIRO

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JPS6212503B von WATAKABE YAICHIRO

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JPS6212502B von WATAKABE YAICHIRO

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JPS6156876B von WATAKABE YAICHIRO

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FORMATION OF PHOTOMASK MATERIAL von WATAKABE YAICHIRO

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PHOTOMASK MATERIAL von WATAKABE YAICHIRO

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FORMATION OF PHOTOMASK MATERIAL von WATAKABE YAICHIRO

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