Surface Segregation Analysis of Hydrophobic Additive of Non-topcoat Resist von Hagiwara, Takuya, Ishibashi, Takeo, Terai, Mamoru, Kumada, Teruhiko, Shirota, Naoko, Yokokoji, Osamu, Matsunobu, Takeshi, Man, Naoki, Yoshikawa, Kazuhiro, Tanahashi, Yusuke, Hanawa, Tetsuro

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Novel Wafer Bevel Treatment for Water Immersion Lithography von Terai, Mamoru, Ishibashi, Takeo, Hagiwara, Takuya, Hanna, Tetsuro, Kumada, Teruhiko, Takebe, Yoko, Yokokoji, Osamu, Fujiwara, Tomoharu, Jiang, Jianhai, Niwa, Takafumi, Wakamizu, Shinya, Kyouda, Hideharu

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Development of Novel Materials for 193-nm Dry and Immersion Lithography von Sasaki, Takashi, Shirota, Naoko, Wang, Shu-Zhong, Takebe, Yoko, Yokokoji, Osamu

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Characterization of Fluoropolymer Resist for 157-nm Lithography von Hagiwara, Takuya, Irie, Shigeo, Itani, Toshiro, Kawaguchi, Yasuhide, Yokokoji, Osamu, Kodama, Shun-ichi

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157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers von Irie, Shigeo, Ishikawa, Seiichi, Hagiwara, Takuya, Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Kawaguchi, Yasuhide, Kodama, Syun-ichi, Yokokoji, Osamu, Kaneko, Isamu, Takebe, Yoko, Okada, Shinji

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A New Monocyclic Fluoropolymer for 157-nm Photoresists von Sasaki, Takashi, Takebe, Yoko, eda, Masataka, Yokokoji, Osamu, Irie, Shigeo, Otoguro, Akihito, Fujii, Kiyoshi, Itani, Toshio

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Development of new resist materials for 193-nm dry and immersion lithography von Takebe, Yoko, Sasaki, Takashi, Shirota, Naoko, Yokokoji, Osamu

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METHOD OF PRODUCING FLUORINE-CONTAINING PYRAZOLE CARBOXYLIC ACID HALIDE von SHIMIZU, Tamaki, YOKOKOJI, Osamu, ISHIBASHI, Yuichiro, MATSUMURA, Yasushi

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METHOD OF PRODUCING FLUORINE-CONTAINING PYRAZOLE CARBOXYLIC ACID HALIDE von SHIMIZU, Tamaki, YOKOKOJI, Osamu, ISHIBASHI, Yuichiro, MATSUMURA, Yasushi

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METHOD OF PRODUCING FLUORINE-CONTAINING PYRAZOLE CARBOXYLIC ACID HALIDE von SHIMIZU, Tamaki, YOKOKOJI, Osamu, ISHIBASHI, Yuichiro, MATSUMURA, Yasushi

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RESIST PROTECTIVE FILM COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR FORMING RESIST PATTERN von SHIROTA NAOKO, YOKOKOJI OSAMU

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COATING MATERIAL COMPOSITION FOR LIQUID IMMERSION EXPOSURE APPARATUS, LAMINATE, METHOD FOR FORMING LAMINATE, AND LIQUID IMMERSION EXPOSURE APPARATUS von YOKOKOJI OSAMU, TAKEBE YOKO

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LIQUID-REPELLENT TREATMENT COMPOSITION FOR IMMERSION EXPOSURE APPARATUS, LIQUID-REPELLENT TREATMENT METHOD FOR IMMERSION EXPOSURE APPARATUS, LIQUID-REPELLENT TREATMENT COMPOSITION... von YOKOKOJI OSAMU, TAKEBE YOKO

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COATING MATERIAL COMPOSITION FOR LIQUID IMMERSION EXPOSURE APPARATUS, LAMINATE, METHOD FOR FORMING LAMINATE, AND LIQUID IMMERSION EXPOSURE APPARATUS von YOKOKOJI OSAMU, TAKEBE YOKO

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Production method for dihydropyrazinone derivative von SAWAGUCHI MASANORI, YOKOKOJI OSAMU

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RESIST PROTECTIVE FILM COMPOSITION FOR IMMERSION LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN von YOKOKOJI OSAMU, TAKEBE YOKO

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PRODUCTION METHOD FOR DIHYDROPYRAZINONE DERIVATIVE von SAWAGUCHI, MASANORI, YOKOKOJI, OSAMU

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RESIST PROTECTIVE FILM COMPOSITION FOR IMMERSION LITHOGRAPHY von YOKOKOJI OSAMU, TAKEBE YOKO

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FLUORVERBINDUNG, FLOURPOLYMER UND VERFAHREN ZUR HERSTELLUNG DAVON von TAKEBE, YOKO, YOKOKOJI, OSAMU

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FLUORINE COMPOUND, FLUOROPOLYMER, AND PROCESS FOR PRODUCING THE SAME von TAKEBE, YOKO, YOKOKOJI, OSAMU

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