Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma von Sung, Dain, Wen, Long, Tak, Hyunwoo, Lee, Hyejoo, Kim, Dongwoo, Yeom, Geunyoung

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Effect of bias frequency variation on the characteristics of SiOX thin films deposited by atmospheric pressure chemical vapor deposition using a double discharge system von Park, Jaebeom, Kim, Ga Young, Yeom, Geunyoung

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Fabrication of ordered Au nanodot arrays utilizing anodic aluminum oxide templates formed on Si substrate von Kwon, Namyong, Kim, Namkyu, Yeon, Jekwan, Yeom, Geunyoung, Chung, Ilsub

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Improved Etch Characteristics of Magnetic Tunneling Junction Materials by Using Helium von Park, Sungwoo, Yang, Kyungchae, Lee, Hoseok, Kim, Dongwoo, Baek, Jongung, Shim, Taehun, Park, Jeagun, Yeom, Geunyoung

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Study on plasma characteristics and gas analysis before and after recovery using liquid-fluorocarbon precursor von Park, Junyoung, Oh, Byoungmoon, Kim, Kyongnam, Sung, Dain, Yeom, Geunyoung

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Clean SiO atomic layer etching based on physisorption of high boiling point perfluorocarbon von Sung, Dain, Tak, Hyunwoo, Kim, Heeju, Kim, Dongwoo, Kim, Kyongnam, Yeom, Geunyoung

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Clean SiO 2 atomic layer etching based on physisorption of high boiling point perfluorocarbon von Sung, Dain, Tak, Hyunwoo, Kim, Heeju, Kim, Dongwoo, Kim, Kyongnam, Yeom, Geunyoung

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Clean SiO2 atomic layer etching based on physisorption of high boiling point perfluorocarbon von Dain Sung, Tak, Hyunwoo, Kim, Heeju, Kim, Dongwoo, Kim, Kyongnam, Yeom, Geunyoung

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Three-Dimensional Surface Treatment of MoS 2 Using BCl 3 Plasma-Derived Radicals von Lee, Heesoo, Kim, Hoijoon, Kim, Kihyun, Jeong, Kwangsik, Leem, Mirine, Park, Seunghyun, Kang, Jieun, Yeom, Geunyoung, Kim, Hyoungsub

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Three-Dimensional Surface Treatment of MoS2 Using BCl3 Plasma-Derived Radicals von Lee, Heesoo, Kim, Hoijoon, Kim, Kihyun, Jeong, Kwangsik, Leem, Mirine, Park, Seunghyun, Kang, Jieun, Yeom, Geunyoung, Kim, Hyoungsub

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Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6) von Seong, Inho, You, Yebin, Lee, Youngseok, Choi, Minsu, Sung, Dain, Yeom, Geunyoung, You, ShinJae

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Deposition of carbon nanotubes by capillary-type atmospheric pressure PECVD von Kyung, Sejin, Lee, Yonghyuk, Kim, Chanwoo, Lee, Junhee, Yeom, Geunyoung

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Investigation of SiO 2 Etch Characteristics by C 6 F 6 /Ar/O 2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma von Sung, Dain, Wen, Long, Tak, Hyunwoo, Lee, Hyejoo, Kim, Dongwoo, Yeom, Geunyoung

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Controlled Layer-by-Layer Etching of MoS2 von Lin, TaiZhe, Kang, BaoTao, Jeon, MinHwan, Huffman, Craig, Jeon, JeaHoo, Lee, SungJoo, Han, Wei, Lee, JinYong, Lee, SeHan, Yeom, GeunYoung, Kim, KyongNam

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Atmospheric Pressure Remote Plasma Ashing of Photoresist Using Pin-To-Plate Dielectric Barrier Discharge von Park, Jaebeom, Kyung, Sejin, Yeom, Geunyoung

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Radio Frequency Induction Welding of Silver Nanowire Networks for Transparent Heat Films von Oh, Jisoo, Wen, Long, Tak, Hyunwoo, Kim, Heeju, Kim, Gyowun, Hong, Jongwoo, Chang, Wonjun, Kim, Dongwoo, Yeom, Geunyoung

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Effects of Axial Magnetic Field on Neutral Beam Etching by Low-Angle Forward-Reflected Neutral Beam Method von Lee, Dohaing, Park, ByungJae, Yeom, Geunyoung

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Improvement of a block co-polymer (PS-b-PMMA)-masked silicon etch profile using a neutral beam von Yun, Deokhyun, Park, Jinwoo, Kim, Hwasung, Mun, Jeongho, Kim, Sangouk, Kim, Kyongnam, Yeom, Geunyoung

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Effect of GaN Microlens Array on Efficiency of GaN-Based Blue-Light-Emitting Diodes von Kim, Dongwoo, Lee, Hyoyoung, Cho, Namgil, Sung, Younjoon, Yeom, Geunyoung

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Universal vertical standing of block copolymer microdomains enabled by a gradient block von Song, Seung Won, Hur, Yoon Hyung, Park, Yemin, Cho, Eugene N, Han, Hyeuk Jin, Jang, Hanhwi, Oh, Jisoo, Yeom, Geunyoung, Lee, Jisun, Yoon, Kwang-Sub, Park, Chang-Min, Kim, Insung, Kim, YongJoo, Jung, Yeon Sik

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