Electronic system with health monitoring mechanism and method of operation thereof von Tang, Charles, Yeh, Horng-Li, Nguyen, Truong, Zhang, Dan

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ELECTRONIC SYSTEM AND OPERATING METHOD THEREOF von ZHANG DAN, NGUYEN TRUONG, YEH HORNG LI, TANG CHARLES

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ELECTRONIC SYSTEM WITH HEALTH MONITORING MECHANISM AND METHOD OF OPERATION THEREOF von ZHANG DAN, YEH HORNG-LI, NGUYEN TRUONG, TANG CHARLES

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Asymptotic behavior of nonoscillatory solutions of second-order differential equations von Hwang, Tsang-Hwai, Li, Horng-Jaan, Yeh, Cheh-Chih

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Oscillation criteria for second-order neutral delay difference equations von Li, Horng-Jaan, Yeh, Cheh-Chih

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Pre-charging output peripheral for direct memory access operation von GLEN WILLIAM GIBSON, ROMKRISHNA VEPA, HORNG-LI YEH, DAVID G. ROBERTS, ROBERT ALAN WILLIAMS, JIU AN, DIN-I TSAI

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Some complements of Cauchy's inequality on time scales von Yeh, Cheh-Chih, Hong, Huei-Lin, Li, Horng-Jaan, Yu, Shiueh-Ling

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The relaxation phenomena of positive charges in thin gate oxide during Fowler-Nordheim tunneling stress von Chang, Kow-Ming, Li, Chii-Horng, Wang, Shih-Wei, Yeh, Ta-Hsun, Yang, Ji-Yi, Lee, Tzyh-Cheang

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Nonoscillation criteria for second-order half-linear differential equations von Li, Horng-Jaan, Yeh, Cheh-Chih

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Oscillation and Nonoscillation Criteria for Second Order Linear Differential Equations von Li, Horng-Jaan, Yeh, Cheh-Chih

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Oscillation of nonlinear functional differential equations of the second order von Li, Horng-Jaan, Yeh, Cheh-Chih

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A new simple and reliable method to form a textured Si surface for the fabrication of a tunnel oxide film von Chang, Kow-Ming, Li, Chii-Horng, Sheih, Bao-Sheng, Yang, Ji-Yi, Wang, Shih-Wei, Yeh, Ta-Hsun

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On the Nonoscillatory Behavior of Solutions of a Second Order Linear Differential Equation von Li, Horng-Jaan, Yeh, Cheh-Chih

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The distance between zeros of an oscillatory solution to a half-linear differential equation von Lian, Wei-Cheng, Yeh, Cheh-Chih, Li, Horng-Jaan

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Reduction of selectivity loss probability on dielectric surface during chemical vapor deposition of tungsten using fluorinated oxide and removing silanol units on dielectric surfac... von CHANG, K. M, WANG, S. W, LI, C. H, TSAI, J. Y, YEH, T. H

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Interface characteristics of selective tungsten on silicon using a new pretreatment technology for ULSI application von Chang, K-M, Yeh, T-H, Wang, Sh-W, Li, Ch-H, Tsai, J-Y, Yang, J-Y

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Leakage performance and breakdown mechanism of silicon-rich oxide and fluorinated oxide prepared by electron cyclotron resonance chemical vapor deposition von Chang, Kow Ming, Wang, Shih Wei, Yeh, Ta Hsun, Li, Chii Horng, Luo, Jiunn Jye

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Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor von Chang, Kow Ming, Wang, Shih Wei, Wu, Chin Jen, Yeh, Ta Hsun, Li, Chii Horng, Yang, Ji Yi

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Existence of positive nondecreasing solutions of nonlinear difference equations von Li, Horng Jaan, Yeh, Cheh Chih

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Comprehensive study of plasma pretreatment process for thin gate oxide (< 10 nm) fabricated by electron cyclotron resonance plasma oxidation von CHANG, K.-M, LI, C.-H, FAHN, F.-J, YEH, T.-H, WANG, S.-W

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