Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas von Kim, Soo-Gang, Yang, Kyung-Chae, Shin, Ye-Ji, Kim, Kyong-Nam, Kim, Dong-Woo, Lee, Jeong Yub, Kim, YeonHee, Yeom, Geun-Young

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A study on the etching characteristics of magnetic tunneling junction materials using DC pulse-biased inductively coupled plasmas von Yang, Kyung Chae, Jeon, Min Hwan, Yeom, Geun Young

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Highly oxidation-resistant silver nanowires by CxFy polymers using plasma treatment von Yang, Kyung Chae, Sung, Da In, Shin, Ye Ji, Yeom, Geun Young

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Highly oxidation-resistant silver nanowires by C x F y polymers using plasma treatment von Yang, Kyung Chae, Sung, Da In, Shin, Ye Ji, Yeom, Geun Young

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Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma von Yang, Kyung Chae, Shin, Ye Ji, Tak, Hyun Woo, Lee, Wonseok, Lee, Seung Bae, Yeom, Geun Young

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Etch characteristics of Si and TiO 2 nanostructures using pulse biased inductively coupled plasmas von Kim, Soo-Gang, Yang, Kyung-Chae, Shin, Ye-Ji, Kim, Kyong-Nam, Kim, Dong-Woo, Lee, Jeong Yub, Kim, YeonHee, Yeom, Geun-Young

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SiO2 etch characteristics and environmental impact of Ar/C3F6O chemistry von Lee, Ho Seok, Yang, Kyung Chae, Kim, Soo Gang, Shin, Ye Ji, Suh, Dae Woong, Song, Han Dock, Lee, Nae Eung, Yeom, Geun Young

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Effect of pulse phase lag in the dual synchronized pulsed capacitive coupled plasma on the etch characteristics of SiO2 by using a C4F8/Ar/O2 gas mixture von Jeon, Min Hwan, Yang, Kyung Chae, Kim, Kyong Nam, Yeom, Geun Young

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Etch residue removal of CoFeB using CO/NH3 reactive ion beam for spin transfer torque-magnetic random access memory device von Jeon, Min Hwan, Yang, Kyung Chae, Park, Jin Woo, Yun, Deok Hyun, Kim, Kyong Nam, Yeom, Geun Young

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Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma von Jeon, Min Hwan, Yang, Kyung Chae, Lee, Sehan, Yeom, Geun Young

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나노 반도체 소자를 위한 펄스 플라즈마 식각 기술 von 양경채(Kyung Chae Yang), 박성우(Sung Woo Park), 신태호(Tae Ho Shin), 염근영(Geun Young Yeom)

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Nanoscale Spin-Transfer Torque MRAM Etching Using Various Gases von Yang, Kyung Chae, Park, Sung Woo, Lee, Ho Seok, Yeom, Geun Young

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Etch Damage Reduction of Ultra Low-k Dielectric by Using Pulsed Plasmas von Jang, Jun Ki, Tak, Hyun Woo, Yang, Kyung Chae, Shin, Ye Ji, Hyeon, Jae Young, Kang, Min Guk, Ahn, Jeong Hoon, Yeom, Geun Young

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Influence of pulsed bias frequency on the etching of magnetic tunneling junction materials von Yang, Kyung Chae, Park, Sung Woo, Jeon, Min Hwan, Pham, Viet Phuong, Lee, Du Yeong, Shim, Tae Hun, Park, Jea Gun, Yeom, Geun Young

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Effects of Bacillus subtilis CSL2 on the composition and functional diversity of the faecal microbiota of broiler chickens challenged with Salmonella Gallinarum von Oh, Ju Kyoung, Pajarillo, Edward Alain B, Chae, Jong Pyo, Kim, In Ho, Yang, Dong Soo, Kang, Dae-Kyung

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Etch Damage Reduction of Ultra Low-k Dielectric By Using Pulsed Plasmas von Jang, Jun Ki, Tak, Hyun Woo, Yang, Kyung Chae, Shin, Ye Ji, Kwon, Sang Duk, Yeom, Geun Young

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Nanoscale Spin-Transfer Torque MRAM Etching Using Various Gases von Yang, Kyung Chae, Park, Sung Woo, Lee, Ho Seok, Yeom, Geun Young

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Apparatus for generating plasma and apparatus for treating substrate having the same von Sung, Da In, Yeom, Geun Young, Shin, Ye Ji, Yang, Kyung Chae, Tak, Hyun Woo

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Application of Pulsed Plasmas for Nanoscale Etching of Semiconductor Devices : A Review von Yang, Kyung Chae, Park, Sung Woo, Shin, Tae Ho, Yeom, Geun Young

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APPARATUS FOR GENERATING PLASMA AND APPARATUS FOR TREATING SUBSTRATE HAVING THE SAME von SHIN, Ye Ji, YANG, Kyung Chae, SUNG, Da In, YEOM, Geun Young, Tak, Hyun Woo

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