Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques von Rommel, M., Spoldi, G., Yanev, V., Beuer, S., Amon, B., Jambreck, J., Petersen, S., Bauer, A. J., Frey, L.

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Experimental observation of FIB induced lateral damage on silicon samples von Spoldi, G., Beuer, S., Rommel, M., Yanev, V., Bauer, A.J., Ryssel, H.

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Manufacturing, characterization, and application of nanoimprinted metallic probe demonstrators for electrical scanning probe microscopy von Jambreck, J.D., Yanev, V., Schmitt, H., Rommel, M., Bauer, A.J., Frey, L.

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SSRM characterisation of FIB induced damage in silicon von Beuer, S, Yanev, V, Rommel, M, Bauer, A J, Ryssel, H

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Tuning of Surface Properties of AlGaN/GaN Sensors for Nanodroplets and Picodroplets von Buchheim, C., Kittler, G., Cimalla, V., Lebedev, V., Fischer, M., Krischok, S., Yanev, V., Himmerlich, M., Ecke, G., Schaefer, J.A., Ambacher, O.

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PP film electrets obtained at different temperatures and irradiated by a low energy laser von Yovcheva, T, Eftimov, T, Yanev, V, Viraneva, A, Mekishev, G, Avramova, I

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Characterization of thickness variations of thin dielectric layers at the nanoscale using scanning capacitance microscopy von Yanev, V., Rommel, M., Bauer, A. J., Frey, L.

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Gate oxide reliability at the nanoscale evaluated by combining conductive atomic force microscopy and constant voltage stress von Erlbacher, T., Yanev, V., Rommel, M., Bauer, A. J., Frey, L.

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Improved insight in charge trapping of high- k ZrO 2 / SiO 2 stacks by use of tunneling atomic force microscopy von Paskaleva, A., Yanev, V., Rommel, M., Lemberger, M., Bauer, A. J.

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Comparative study between conventional macroscopic @@iIV@ techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscale von Yanev, V, Erlbacher, T, Rommel, M, Bauer, A J, Frey, L

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Influence of the RF power on the deposition rate and the chemical surface composition of fluorocarbon films prepared in dry etching gas plasma von Yanev, V., Krischok, S., Opitz, A., Wurmus, H., Schaefer, J.A., Schwesinger, N., Ahmed, S.-I.-U.

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(Invited) Electrical Scanning Probe Microscopy Techniques for the Detailed Characterization of High-k Dielectric Layers von Rommel, Mathias, Yanev, Vasil, Paskaleva, Albena, Erlbacher, Tobias, Lemberger, Martin, Bauer, Anton J., Frey, Lothar

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Characterization of Ru and RuO 2 thin films prepared by pulsed metal organic chemical vapor deposition von Roeder, G., Manke, C., Baumann, P. K., Petersen, S., Yanev, V., Gschwandtner, A., Ruhl, G., Petrik, P., Schellenberger, M., Pfitzner, L., Ryssel, H.

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SYSTEM AND METHOD FOR IMPROVING TEMPERATURE DETECTORS USING EXPANSION/CONTRACTION DEVICES von Yanev, Lyuvomir V, Grigorov, Valentin G, Chevlarov, Nikolay S

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Influence of the RF power on the deposition rate and the chemical surface composition of fluorocarbon films prepared in dry etching gas plasma von YANEV, V, KRISCHOK, S, OPITZ, A, WURMUS, H, SCHAEFER, J. A, SCHWESINGER, N, AHMED, S.-I.-U

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Characterization of thickness variations of thin dielectric layersat the nanoscale using scanning capacitance microscopy von Yanev, V., Rommel, M., Bauer, A. J., Frey, L.

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Gate oxide reliability at the nano-scale evaluated by combining cAFM and CVS von Erlbacher, T, Yanev, V, Rommel, M, Bauer, A.J, Frey, L

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Investigations of MBE grown InN and the influence of sputtering on the surface composition von KRISCHOK, S, YANEV, V, LU, H, SCHAFF, W. J, EASTMAN, L. F, BALYKOV, O, HIMMERLICH, M, SCHAEFER, J. A, KOSIBA, R, ECKE, G, CIMALLA, I, CIMALLA, V, AMBACHER, O

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Electrical scanning probe microscopy techniques for the detailed characterization of high-k dielectric layers von Rommel, M, Yanev, V, Paskaleva, A, Erlbacher, T, Lemberger, M, Bauer, A.J, Frey, L

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Comprehensive study of focused ion beam induced lateral damagein silicon by scanning probe microscopy techniques von Rommel, M., Spoldi, G., Yanev, V., Beuer, S., Amon, B., Jambreck, J., Petersen, S., Bauer, A. J., Frey, L.

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