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    Failure analysis of integrated circuits beyond the diffraction limit : Contact mode near-field scanning optical microscopy with integrated resistance, capacitance, and UV confocal imaging : Near-field optics imaging

    Failure analysis of integrated circuits beyond the diffraction limit : Contact mode near-field scanning optical microscopy with integrated resistance, capacitance, and UV confocal... von LEWIS, Aaron, SHAMBROT, Efim, RADKO, Anna, LIEBERMAN, Klony, EZEKIEL, Solomon, VEINGER, Dimitry, YAMPOLSKI, Gila

    Veröffentlicht in Proceedings of the IEEE

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