High Aspect Pattern Fabrication by Nano Imprint Lithography Using Fine Diamond Mold von Hirai, Yoshihiko, Yoshida, Satoshi, Takagi, Nobuyuki, Tanaka, Yoshio, Yabe, Hideki, Sasaki, Kei, Sumitani, Hiroaki, Yamamoto, Kazuhiro

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Validity of double and triple Gaussian functions for proximity effect correction in X-ray mask writing von AYA, S, KISE, K, YABE, H, MARUMOTO, K

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Improvement of pattern and position accuracies by multiple electron beam writing for X-ray mask fabrication von AYA, S, MARUMOTO, K, YABE, H, MATSUI, Y

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The growth mechanism of diamond crystals in acetylene flames von MATSUI, Y, YABE, H, HIROSE, Y

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Stress Stability of W–Ti X-Ray Absorber in Patterning Process von Kitamura, Kaeko, Yabe, Hideki, Ami, Shigeto, Kise, Koji, Aya, Sunao, Marumoto, Kenji, Satoh, Shin-ichi

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Pattern Resolution in X-ray Lithography Using Pattern Replication Technique on a Mask von Kise, Koji, Amemiya, Mitsuaki, Watanabe, Hiroshi, Itoga, Kenji, Yabe, Hideki, Sumitani, Hiroaki

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A principle of deposition of ultra low and uniform stress absorber for X-ray mask von KITAMURA, K, YABE, H, SASAKI, K, AMI, S, KISE, K, AYA, S, MARUMOTO, K

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The numerical simulation of diamond synthesis from acetylene flames von Matsui, Yasuji, Yabe, Hideki, Hirose, Yoichi

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An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks von Kise, Koji, Aya, Sunao, Yabe, Hideki, Kitamura, Kaeko, Marumoto, Kenji

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Studies on Defect Inspectability and Printability Using Programmed-Defect X-Ray Mask von Watanabe, Hiroshi, Kikuchi, Yukiko, Marumoto, Kenji, Matsui, Yasuji, Yabe, Hideki, Aya, Sunao, Okada, Ikuo, Takeuchi, Nobuyuki

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Sputtered W-Ti Film for X-Ray Mask Absorber von Yabe, Hideki, Marumoto, Kenji, Aya, Sunao, Yoshioka, Nobuyuki, Fujino, Takeshi, Watakabe, Yaichiro, Yasuji Matsui, Yasuji Matsui

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Fabrication of Diamond Membranes for X-Ray Masks by Hot-Filament Method von Marumoto, Kenji, Yabe, Hideki, Matsui, Yasuji, Yamashita, Hiroaki, Kikuchi, Noribumi

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An ultralow stress Ta4B absorber for X-ray masks von SHOKI, T, OHKUBO, R, SAKURAI, T, KAWAHARA, T, ANNAKA, N, YABE, H, AYA, S

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The effect of silver ion on electrodeposition of tungsten and tungsten carbide from molten chloride von Yabe, Hideki, Ema, Keiko, Ito, Yasuhiko

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The dissociation equilibria of tungstate ion in a molten fluoride and effect on electrodeposition von YABE, H, EMA, K, ITO, Y

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X-ray mask fabrication process using Cr mask and ITO stopper in the dry etching of W absorber von FUJINO, T, SASAKI, K, MARUMOTO, K, YABE, H, YOSHIOKA, N, WATAKABE, Y

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Electron beam writing techniques for fabricating highly accurate X-ray masks von KISE, K, AYA, S, YABE, H, MARUMOTO, K, HIFUMI, T, MATSUI, Y

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Study of surface reaction probability of CFx radicals by trench deposition method von YABE, H, YUUKI, A, MATSUI, Y

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Fine pattern etching of W-Ti absorber for X-ray mask with electron cyclotron resonance discharge plasmas von MARUMOTO, K, YABE, H, AYA, S, MATSUBA, M, SASAKI, K, WATANABE, Y, MATSUI, Y

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Proximity effect correction for 1:1 X-ray mask fabrication von AYA, S, MORIIZUMI, K, FUJINO, T, KAMIYAMA, K, MINAMI, H, KISE, K, YABE, H, MARUMOTO, K, MATSUI, Y

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