Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology von Liu, Shiyuan, Chen, Xiuguo, Zhang, Chuanwei

Volltext

Broadband optical properties of graphene and HOPG investigated by spectroscopic Mueller matrix ellipsometry von Song, Baokun, Gu, Honggang, Zhu, Simin, Jiang, Hao, Chen, Xiuguo, Zhang, Chuanwei, Liu, Shiyuan

Volltext

Complex optical conductivity of Bi2Se3 thin film: Approaching two-dimensional limit von Fang, Mingsheng, Wang, Zhenyu, Gu, Honggang, Song, Baokun, Guo, Zhengfeng, Zhu, Jinlong, Chen, Xiuguo, Zhang, Chuanwei, Jiang, Hao, Liu, Shiyuan

Volltext

Deep learning-based characterization of ion implantation parameters for photo modulated optical reflectance von Wang, Xuesong, Zhang, Lijun, Sun, Yong, Min, Jin, Wang, Zhongyu, Liu, Shiyuan, Chen, Xiuguo, Tang, Zirong

Volltext

Towards understanding the detection of profile asymmetry from Mueller matrix differential decomposition von Chen, Xiuguo, Jiang, Hao, Zhang, Chuanwei, Liu, Shiyuan

Volltext

Machine learning aided solution to the inverse problem in optical scatterometry von Liu, Shuo, Chen, Xiuguo, Yang, Tianjuan, Guo, Chunfu, Zhang, Jiahao, Ma, Jianyuan, Chen, Chao, Wang, Cai, Zhang, Chuanwei, Liu, Shiyuan

Volltext

Advanced Mueller matrix ellipsometry: Instrumentation and emerging applications von Chen, XiuGuo, Gu, HongGang, Liu, JiaMin, Chen, Chao, Liu, ShiYuan

Volltext

Thickness dependent native oxidation kinetics observation and prediction for Cu films using spectroscopic ellipsometry von Liu, Jiamin, Jiang, Hao, Zhang, Lin, Gu, Honggang, Chen, Xiuguo, Liu, Shiyuan

Volltext

Optimal polarization modulation for orthogonal two-axis Lloyd's mirror interference lithography von Chen, Xiuguo, Ren, Zongwei, Shimizu, Yuki, Chen, Yuan-Liu, Gao, Wei

Volltext

Development of a tomographic Mueller-matrix scatterometer for nanostructure metrology von Tan, Yinyin, Chen, Chao, Chen, Xiuguo, Du, Weichao, Gu, Honggang, Liu, Shiyuan

Volltext

Layer‐Dependent Dielectric Function of Wafer‐Scale 2D MoS2 von Song, Baokun, Gu, Honggang, Fang, Mingsheng, Chen, Xiuguo, Jiang, Hao, Wang, Renyan, Zhai, Tianyou, Ho, Yen‐Teng, Liu, Shiyuan

Volltext

An insight on optical metrology in manufacturing von Shimizu, Yuki, Chen, Liang Chia, Kim, Dae Wook, Chen, Xiuguo, Li, Xinghui, Matsukuma, Hiraku

Volltext

Self-calibration of Fizeau interferometer and planar scale gratings in Littrow setup von Chen, Xiuguo, Shimizu, Yuki, Xiong, Xin, Chen, Yuan-Liu, Gao, Wei

Volltext

Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter von Chen, Xiuguo, Liu, Shiyuan, Gu, Honggang, Zhang, Chuanwei

Volltext

Laser autocollimation based on an optical frequency comb for absolute angular position measurement von Chen, Yuan-Liu, Shimizu, Yuki, Tamada, Jun, Nakamura, Kazuki, Matsukuma, Hiraku, Chen, Xiuguo, Gao, Wei

Volltext

Generalized method for probing ideal initial polarization states in multibeam Lloyd's mirror interference lithography of 2D scale gratings von Chen, Xiuguo, Shimizu, Yuki, Chen, Chong, Chen, Yuan-Liu, Gao, Wei

Volltext

Temperature dependence of femtosecond photoacoustic process in high-precision characterization for metal nanofilms von Wang, Zhongyu, Min, Jing, Sun, Yong, Wang, Xuesong, Chen, Xiuguo, Tang, Zirong, Liu, Shiyuan

Volltext

Determination of an optimal measurement configuration in optical scatterometry using global sensitivity analysis von Dong, Zhengqiong, Liu, Shiyuan, Chen, Xiuguo, Zhang, Chuanwei

Volltext

Development of a spectroscopic Mueller matrix imaging ellipsometer for nanostructure metrology von Chen, Xiuguo, Du, Weichao, Yuan, Kui, Chen, Jun, Jiang, Hao, Zhang, Chuanwei, Liu, Shiyuan

Volltext

A Liquid-Surface-Based Three-Axis Inclination Sensor for Measurement of Stage Tilt Motions von Shimizu, Yuki, Kataoka, Satoshi, Ishikawa, Tatsuya, Chen, Yuan-Liu, Chen, Xiuguo, Matsukuma, Hiraku, Gao, Wei

Volltext