Using block copolymer architecture to achieve sub-10 nm periods von Sun, Zhiwei, Zhang, Wenxu, Hong, Song, Chen, Zhenbin, Liu, Xiaohui, Xiao, Shuaigang, Coughlin, E. Bryan, Russell, Thomas P.

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Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media von Yang, XiaoMin, Xiao, Shuaigang, Hu, Wei, Hwu, Justin, van de Veerdonk, René, Wago, Koichi, Lee, Kim, Kuo, David

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Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays von Xiao, Shuaigang, Yang, XiaoMin, Edwards, Erik W, La, Young-Hye, Nealey, Paul F

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Advanced Lithography for Bit Patterned Media von XiaoMin Yang, Yuan Xu, Kim Lee, Shuaigang Xiao, Kuo, D., Weller, D.

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Circular Nanopatterns over Large Areas from the Self-Assembly of Block Copolymers Guided by Shallow Trenches von Hong, Sung Woo, Gu, Xiaodan, Huh, June, Xiao, Shuaigang, Russell, Thomas P

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A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed self-assembly von Xiao, Shuaigang, Yang, XiaoMin, Hwu, Justin J., Lee, Kim Y., Kuo, David

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Solvent-Assisted Directed Self-Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays von Gu, Weiyin, Xu, Ji, Kim, Jung-Keun, Hong, Sung Woo, Wei, Xinyu, Yang, Xiaomin, Lee, Kim Y., Kuo, David S., Xiao, Shuaigang, Russell, Thomas P.

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A General Route to Macroscopic Hierarchical 3D Nanowire Networks von Wang, Donghai, Luo, Hongmei, Kou, Rong, Gil, Maria P., Xiao, Shuaigang, Golub, Vladimir O., Yang, Zhenzhong, Brinker, C. Jeffrey, Lu, Yunfeng

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Directed Self‐Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch 2 and Beyond von Yang, XiaoMin, Xiao, Shuaigang, Hsu, Yautzong, Feldbaum, Michael, Lee, Kim, Kuo, David

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A Novel Approach to Addressable 4 Teradot/in.2 Patterned Media von Xiao, Shuaigang, Yang, XiaoMin, Park, Soojin, Weller, Dieter, Russell, Thomas P.

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Nanoimprint lithography guiding templates for advanced magnetic media fabrication von Staaks, Daniel, Hsu, Yautzong, Lee, Kim Y., Steiner, Philip L., Yu, Zhaoning, Wu, Jason J., Xiao, ShuaiGang, Yang, XiaoMin, Chang, Thomas Y.

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Nanoscopic templates using self-assembled cylindrical diblock copolymers for patterned media von Yang, XiaoMin, Xiao, Shuaigang, Liu, Chao, Pelhos, Kalman, Minor, Kevin

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Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch(2) and Beyond von Yang, Xiaomin, Wan, Lei, Xiao, Shuaigang, Xu, Yuan, Weller, Dieter K

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Servo-Integrated Patterned Media by Hybrid Directed Self-Assembly von Xiao, Shuaigang, Yang, Xiaomin, Steiner, Philip, Hsu, Yautzong, Lee, Kim, Wago, Koichi, Kuo, David

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Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Temp... von Sun, Zhiwei, Chen, Zhenbin, Zhang, Wenxu, Choi, Jaewon, Huang, Caili, Jeong, Gajin, Coughlin, E. Bryan, Hsu, Yautzong, Yang, XiaoMin, Lee, Kim Y., Kuo, David S., Xiao, Shuaigang, Russell, Thomas P.

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Fabrication of Silicon Oxide Nanodots with an Areal Density Beyond 1 Teradots Inch−2 von Xu, Ji, Hong, Sung Woo, Gu, Weiyin, Lee, Kim Y., Kuo, David S., Xiao, Shuaigang, Russell, Thomas P.

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Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2) von Xu, Ji, Hong, Sung Woo, Gu, Weiyin, Lee, Kim Y, Kuo, David S, Xiao, Shuaigang, Russell, Thomas P

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Corrigendum: A facile route to regular and non-regular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed self-assembly von Xiao, Shuaigang, Yang, XiaoMin, Hwu, Justin J., Lee, Kim Y., Kuo, David

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Aligned nanowires and nanodots by directed block copolymer assembly von Xiao, Shuaigang, Yang, XiaoMin, Lee, Kim Y, ver der Veerdonk, Rene J M, Kuo, David, Russell, Thomas P

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Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch 2 and Beyond von Yang, XiaoMin, Wan, Lei, Xiao, Shuaigang, Xu, Yuan, Weller, Dieter K.

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