Control of conducting filaments in TiO2 films by a thin interfacial conducting oxide layer at the cathode von Keun Kim, Seong, Joon Choi, Byung, Jean Yoon, Kyung, Woo Yoo, Yeon, Seong Hwang, Cheol

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Variation in the threshold voltage of amorphous-In2Ga2ZnO7 thin-film transistors by ultrathin Al2O3 passivation layer von Ho Rha, Sang, Ki Kim, Un, Jung, Jisim, Suk Hwang, Eun, Jun Lee, Seung, Jeon, Woojin, Woo Yoo, Yeon, Choi, Jung-Hae, Seong Hwang, Cheol

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Effect of TiO2 on mechanical and thermal properties of Al2O3-based coating via atmospheric plasma spraying von Kwon, Hansol, Yoo, Yeon Woo, Park, Youngjin, Nam, Uk Hee, Byon, Eungsun

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Effect of Process-Gas Composition on In-Flight and Deposition Characteristics of Atmospheric Plasma-Sprayed Ni Particles von Kwon, Hansol, Kang, Yong-jin, Yoo, Yeon Woo, Kim, Do Hyun, Park, Youngjin, Lee, Sunghun, Park, Hunkwan

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Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo Electrodes von Yoo, Yeon Woo, Jeon, Woojin, Lee, Woongkyu, An, Cheol Hyun, Kim, Seong Keun, Hwang, Cheol Seong

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Bioinspired plasmonic nanoflower-decorated microneedle for label-free intradermal sensing von Linh, Vo Thi Nhat, Yim, Sang-Gu, Mun, ChaeWon, Yang, Jun-Yeong, Lee, Seunghun, Yoo, Yeon Woo, Sung, Dong Kyung, Lee, Yong-Ill, Kim, Dong-Ho, Park, Sung-Gyu, Yang, Seung Yun, Jung, Ho Sang

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서스펜션 진공 플라즈마 용사법을 통한 YSZ 코팅의 형성 von 유연우(Yeon Woo Yoo), 변응선(Eungsun Byon)

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Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors von Lee, Woongkyu, Han, Jeong Hwan, Jeon, Woojin, Yoo, Yeon Woo, Lee, Sang Woon, Kim, Seong Keun, Ko, Chang-Hee, Lansalot-Matras, Clement, Hwang, Cheol Seong

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Bacterial entombment by intratubular mineralization following orthograde mineral trioxide aggregate obturation： a scanning electron microscopy study von Yoo, Jun Sang, Chang, Seok-Woo, Oh, So Ram, Perinpanayagam, Hiran, Lim, Sang-Min, Yoo, Yeon-Jee, Oh, Yeo-Rok, Woo, Sang-Bin, Han, Seung-Hyun, Zhu, Qiang, Kum, Kee-Yeon

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Highly improved oxidation resistance of TiC–SKD11 composite by SiC/TiB2 based hybrid coating von Cho, Seungchan, Jo, Ilguk, Lee, Yeong-Hwan, Yoo, Yeon Woo, Byon, Eungsun, Lee, Sang-Kwan, Lee, Sang-Bok

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진공 플라즈마 용사법을 통해 형성된 NiCoCrAlY 오버레이 코팅의 반복 산화 거동 von 유연우(Yeon Woo Yoo), 남욱희(Uk Hee Nam), 박훈관(Hunkwan Park), 박영진(Youngjin Park), 이성훈(Sunghun Lee), 변응선(Eungsun Byon)

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Effect of TiO 2 on mechanical and thermal properties of Al 2 O 3 -based coating via atmospheric plasma spraying von Kwon, Hansol, Yoo, Yeon Woo, Park, Youngjin, Nam, Uk Hee, Byon, Eungsun

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Reducing the nano-scale defect formation of atomic-layer-deposited SrTiO3 films by adjusting the cooling rate of the crystallization annealing of the seed layer von Lee, Woongkyu, Yoo, Sijung, Jeon, Woojin, Yoo, Yeon Woo, An, Cheol Hyun, Chung, Min Jung, Kim, Han Joon, Lee, Sang Woon, Hwang, Cheol Seong

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Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin Films von Jeon, Woojin, Rha, Sang Ho, Lee, Woongkyu, Yoo, Yeon Woo, An, Cheol Hyun, Jung, Kwang Hwan, Kim, Seong Keun, Hwang, Cheol Seong

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Structure and Electrical Properties of Al-Doped HfO 2 and ZrO 2 Films Grown via Atomic Layer Deposition on Mo Electrodes von Yoo, Yeon Woo, Jeon, Woojin, Lee, Woongkyu, An, Cheol Hyun, Kim, Seong Keun, Hwang, Cheol Seong

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Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO 2 Thin Films von Jeon, Woojin, Rha, Sang Ho, Lee, Woongkyu, Yoo, Yeon Woo, An, Cheol Hyun, Jung, Kwang Hwan, Kim, Seong Keun, Hwang, Cheol Seong

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Atomic Layer Deposition of SrTiO 3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors von Lee, Woongkyu, Han, Jeong Hwan, Jeon, Woojin, Yoo, Yeon Woo, Lee, Sang Woon, Kim, Seong Keun, Ko, Chang-Hee, Lansalot-Matras, Clement, Hwang, Cheol Seong

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Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 films von Jeon, Woojin, Lee, Woongkyu, Yoo, Yeon Woo, An, Cheol Hyun, Han, Jeong Hwan, Kim, Seong Keun, Hwang, Cheol Seong

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Variation in the threshold voltage of amorphous-In 2 Ga 2 ZnO 7 thin-film transistors by ultrathin Al 2 O 3 passivation layer von Ho Rha, Sang, Ki Kim, Un, Jung, Jisim, Suk Hwang, Eun, Jun Lee, Seung, Jeon, Woojin, Woo Yoo, Yeon, Choi, Jung-Hae, Seong Hwang, Cheol

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Chemistry of active oxygen in RuO sub(x) and its influence on the atomic layer deposition of TiO sub(2) films von Jeon, Woojin, Lee, Woongkyu, Yoo, Yeon Woo, An, Cheol Hyun, Han, Jeong Hwan, Kim, Seong Keun, Hwang, Cheol Seong

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