Method for providing user interface and electronic device therefor von Kim, Jongho, Hwang, Sangwoong, Won, Seolhye, Yoon, Hoon, Sohn, Minjung, Lee, Kangmin

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METHOD FOR PROVIDING USER INTERFACE AND ELECTRONIC DEVICE THEREFOR von HWANG, Sangwoong, SOHN, Minjung, LEE, Kangmin, YOON, Hoon, KIM, Jongho, WON, Seolhye

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METHOD FOR PROVIDING USER INTERFACE AND ELECTRONIC DEVICE THEREFOR von HWANG, Sangwoong, SOHN, Minjung, LEE, Kangmin, YOON, Hoon, KIM, Jongho, WON, Seolhye

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DISPLAY APPARATUS AND CONTROL METHOD THEREOF von JONGHO KIM, JIYOON MIN, HYE JIN LEE, SEOLHYE WON

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DISPLAY APPARATUS AND CONTROL METHOD THEREOF von LEE, Hyejin, KIM, Jongho, WON, Seolhye, MIN, Jiyoon

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ELECTRONIC DEVICE PROVIDING SAFETY SERVICE AND METHOD THEREOF von LEE KANGMIN, SOHN MINJUNG, KIM JONGHO, WON SEOLHYE, YOON HOON, HWANG SANGWOONG

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ELECTRONIC DEVICE AND METHOD FOR PROVIDING SAFETY SERVICE von HWANG, Sangwoong, SOHN, Minjung, LEE, Kangmin, YOON, Hoon, KIM, Jongho, WON, Seolhye

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METHOD FOR PROVIDING USER INTERFACE DURING COMMUNICATION AND ELECTRONIC DEVICE THEREFOR von LEE KANGMIN, SOHN MINJUNG, KIM JONGHO, WON SEOLHYE, YOON HOON, HWANG SANGWOONG

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Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate von Ryu, Sangwon, Kwon, Ji-Won, Park, Jihoon, Lee, Ingyu, Park, Seolhye, Kim, Gon-Ho

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Plasma information-based virtual metrology (PI-VM) and mass production process control von Park, Seolhye, Seong, Jaegu, Jang, Yunchang, Roh, Hyun-Joon, Kwon, Ji-Won, Lee, Jinyoung, Ryu, Sangwon, Song, Jaemin, Roh, Ki-Baek, Noh, Yeongil, Park, Yoona, Jang, Yongsuk, Cho, Taeyoung, Yang, Jae-Ho, Kim, Gon-Ho

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Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma von Kwon, Ji-Won, Ryu, Sangwon, Park, Jihoon, Lee, Haneul, Jang, Yunchang, Park, Seolhye, Kim, Gon-Ho

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Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma von Lee, Haneul, Kim, Nam-Kyun, Lee, Myeong-Geon, Kwon, Ji-Won, Son, Sung Hyun, Bae, Namjae, Park, Taejun, Park, Seolhye, Kim, Gon-Ho

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Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth von Jang, Yunchang, Roh, Hyun-Joon, Park, Seolhye, Jeong, Sangmin, Ryu, Sanywon, Kwon, Ji-Won, Kim, Nam-Kyun, Kim, Gon-Ho

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Application of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing von Park, Seolhye, Cho, Taeyoung, Jang, Yongsuk, Noh, Yeongil, Choi, Younghoon, Cha, Taewon, Lee, Juyoung, Kim, Byungsoo, Yang, Jae-Ho, Hong, Jeong-Jin, Park, Youngkwan, Kim, Gon-Ho, Jang, Won-Hyouk

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