Template fabrication schemes for step and flash imprint lithography von Bailey, T.C., Resnick, D.J., Mancini, D., Nordquist, K.J., Dauksher, W.J., Ainley, E., Talin, A., Gehoski, K., Baker, J.H., Choi, B.J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.

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New Approaches to Nanofabrication:  Molding, Printing, and Other Techniques von Gates, Byron D, Xu, Qiaobing, Stewart, Michael, Ryan, Declan, Willson, C. Grant, Whitesides, George M

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Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology von Bailey, T.C., Johnson, S.C., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G., Resnick, D.J.

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Fabrication of multi-tiered structures on step and flash imprint lithography templates von Johnson, S., Resnick, D.J., Mancini, D., Nordquist, K., Dauksher, W.J., Gehoski, K., Baker, J.H., Dues, L., Hooper, A., Bailey, T.C., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.

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Preparation of porous polymer membranes using nano- or micro-pillar arrays as templates von Yan, Xiaohu, Liu, Guojun, Dickey, Michael, Willson, C. Grant

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Direct Measurement of the Reaction Front in Chemically Amplified Photoresists von Lin, Eric K., Soles, Christopher L., Goldfarb, Dario L., Trinque, Brian C., Burns, Sean D., Jones, Ronald L., Lenhart, Joseph L., Angelopoulos, Marie, Willson, C. Grant, Satija, Sushil K., Wu, Wen-li

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Improved step and flash imprint lithography templates for nanofabrication von Resnick, D.J., Mancini, D., Dauksher, W.J., Nordquist, K., Bailey, T.C., Johnson, S., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.

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NOVEL CHEMICALLY AMPLIFIED DRY-DEVELOPING IMAGING MATERIALS FOR HIGH RESOLUTION MICROLITHOGRAPHY von Frchet, J.M.J., Fahey, J., Lee, S. M., Matuszczak, S., Shacham-Diamand, Y., MacDonald, S.A., Willson, C.G.

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Design of Photoresists with Reduced Environmental Impact. 1. Water-Soluble Resists Based on Photo-Cross-Linking of Poly(vinyl alcohol) von Havard, Jennifer M, Shim, Sang-Yeon, Fréchet, Jean M. J, Lin, Qinghuang, Medeiros, David R, Willson, C. Grant, Byers, Jeffrey D

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CHEMICALLY AMPLIFIED IMAGING MATERIALS BASED ON ACID-CATALYZED REACTIONS OF POLYESTERS OR ELECTROPHILIC CROSSLINKING PROCESSES von Fréchet, J.M.J., Kryczka, B., Matuszczak, S., Reck, B., Stanciulescu, M., Willson, C.G.

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Al/Al2O3 film growth and laser-induced transformation von WANG, Q, ZHAO, W, LOZANO, J, SUN, Y.-M, WILLSON, C. G, WHITE, J. M

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Al/Al 2O 3 film growth and laser-induced transformation von Wang, Q., Zhao, W., Lozano, J., Sun, Y.-M., Willson, C.G., White, J.M.

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Step and Flash Imprint Lithography von Bailey, T.C, Johnson, S.C, Sreenivasan, S.V, Ekerdt, J.G, Willson, C.G, Resnick, D.J

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Ultrafast deep UV Lithography with excimer lasers von Jain, K., Willson, C.G., Lin, B.J.

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Deep UV photoresists I. Meldrum's diazo sensitizer von Grant, B.D., Clecak, N.J., Twieg, R.J., Willson, C.G.

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Passive evaluation of surface and bulk ionic deposition from resist removal using surface photovoltage von Brown, S., Ackmann, P., Wenner, V., Lowell, J., Ostrout, W., Willson, C.G.

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Generation and relaxation of free volume during the post exposure bake von Stewart, M.D., Burns, S.D., Schmid, G.M., Willson, C.G.

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Molecular level simulation of the free volume effect on acid transport von Schmid, G.M., Burns, S.D., Stewart, M.D., Singh, V.K., Willson, C.G.

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Correlative studies of track-etch behaviour and chemical development of lithographic polymer resists von O'Sullivan, D., Price, P.B., Kinoshita, K., Willson, C.G.

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Development and advantages of step-and-flash lithography von Colburn, M, Bailey, T, Choi, B.J, Ekerdt, J.G, Sreenivasan, S.V, Willson, C.G

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