Japan Prize: C.G. Willson and J.M.J. Fréchet / NAS Award for Initiatives in Research: T. Betley / NAS Award in Chemical Sciences: G.A. Somorjai

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Template fabrication schemes for step and flash imprint lithography von Bailey, T.C., Resnick, D.J., Mancini, D., Nordquist, K.J., Dauksher, W.J., Ainley, E., Talin, A., Gehoski, K., Baker, J.H., Choi, B.J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.

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New Approaches to Nanofabrication:  Molding, Printing, and Other Techniques von Gates, Byron D, Xu, Qiaobing, Stewart, Michael, Ryan, Declan, Willson, C. Grant, Whitesides, George M

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Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology von Bailey, T.C., Johnson, S.C., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G., Resnick, D.J.

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Improved step and flash imprint lithography templates for nanofabrication von Resnick, D.J., Mancini, D., Dauksher, W.J., Nordquist, K., Bailey, T.C., Johnson, S., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.

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Fabrication of multi-tiered structures on step and flash imprint lithography templates von Johnson, S., Resnick, D.J., Mancini, D., Nordquist, K., Dauksher, W.J., Gehoski, K., Baker, J.H., Dues, L., Hooper, A., Bailey, T.C., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.

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Japan-Preis: C.G. Willson und J.M.J. Fréchet ausgezeichnet / NAS Award for Initiatives in Research: T. Betley / NAS Award in Chemical Sciences: G.A. Somorjai

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Preparation of porous polymer membranes using nano- or micro-pillar arrays as templates von Yan, Xiaohu, Liu, Guojun, Dickey, Michael, Willson, C. Grant

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Direct Measurement of the Reaction Front in Chemically Amplified Photoresists von Lin, Eric K., Soles, Christopher L., Goldfarb, Dario L., Trinque, Brian C., Burns, Sean D., Jones, Ronald L., Lenhart, Joseph L., Angelopoulos, Marie, Willson, C. Grant, Satija, Sushil K., Wu, Wen-li

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Al/Al2O3 film growth and laser-induced transformation von WANG, Q, ZHAO, W, LOZANO, J, SUN, Y.-M, WILLSON, C. G, WHITE, J. M

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Deep UV photoresists I. Meldrum's diazo sensitizer von Grant, B.D., Clecak, N.J., Twieg, R.J., Willson, C.G.

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Al/Al 2O 3 film growth and laser-induced transformation von Wang, Q., Zhao, W., Lozano, J., Sun, Y.-M., Willson, C.G., White, J.M.

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NOVEL CHEMICALLY AMPLIFIED DRY-DEVELOPING IMAGING MATERIALS FOR HIGH RESOLUTION MICROLITHOGRAPHY von Frchet, J.M.J., Fahey, J., Lee, S. M., Matuszczak, S., Shacham-Diamand, Y., MacDonald, S.A., Willson, C.G.

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CHEMICALLY AMPLIFIED IMAGING MATERIALS BASED ON ACID-CATALYZED REACTIONS OF POLYESTERS OR ELECTROPHILIC CROSSLINKING PROCESSES von Fréchet, J.M.J., Kryczka, B., Matuszczak, S., Reck, B., Stanciulescu, M., Willson, C.G.

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Design of Photoresists with Reduced Environmental Impact. 1. Water-Soluble Resists Based on Photo-Cross-Linking of Poly(vinyl alcohol) von Havard, Jennifer M, Shim, Sang-Yeon, Fréchet, Jean M. J, Lin, Qinghuang, Medeiros, David R, Willson, C. Grant, Byers, Jeffrey D

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Preparation of oriented multilayers of poly(silane)s by the Langmuir-Blodgett technique von EMBS, F. W, WEGNER, G, NEHER, D, ALBOUY, P, MILLER, R. D, WILLSON, C. G, SCHREPP, W

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Step and Flash Imprint Lithography von Bailey, T.C, Johnson, S.C, Sreenivasan, S.V, Ekerdt, J.G, Willson, C.G, Resnick, D.J

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Ultrafast deep UV Lithography with excimer lasers von Jain, K., Willson, C.G., Lin, B.J.

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Passive evaluation of surface and bulk ionic deposition from resist removal using surface photovoltage von Brown, S., Ackmann, P., Wenner, V., Lowell, J., Ostrout, W., Willson, C.G.

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Correlative studies of track-etch behaviour and chemical development of lithographic polymer resists von O'Sullivan, D., Price, P.B., Kinoshita, K., Willson, C.G.

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