Fabrication of Ultrasmall Si Encapsulated in Silicon Dioxide and Silicon Nitride as Alternative to Impurity Doping von Frentzen, Michael, Michailow, Michail, Ran, Ke, Wilck, Noël, Mayer, Joachim, Smith, Sean C., König, Dirk, Knoch, Joachim

Volltext

Turning Low-Nanoscale Intrinsic Silicon Highly Electron-Conductive by SiO2 Coating von König, Dirk, Frentzen, Michael, Wilck, Noël, Berghoff, Birger, Píš, Igor, Nappini, Silvia, Bondino, Federica, Müller, Merlin, Gonzalez, Sara, Di Santo, Giovanni, Petaccia, Luca, Mayer, Joachim, Smith, Sean, Knoch, Joachim

Volltext

Intrinsic ultrasmall nanoscale silicon turns n-/p-type with SiO2/Si3N4-coating von König, Dirk, Hiller, Daniel, Wilck Noël, Berghoff Birger, Müller Merlin, Thakur Sangeeta, Di Santo Giovanni, Petaccia Luca, Mayer, Joachim, Smith, Sean, Knoch Joachim

Volltext

Origin and Quantitative Description of the NESSIAS Effect at Si Nanostructures von König, Dirk, Frentzen, Michael, Hiller, Daniel, Wilck, Noël, Santo, Giovanni Di, Petaccia, Luca, Píš, Igor, Bondino, Federica, Magnano, Elena, Mayer, Joachim, Knoch, Joachim, Smith, Sean C.

Volltext

Structural characterization of crystallized Si thin film material by HRTEM and Raman spectroscopy von Mchedlidze, Teimuraz, Beigmohamadi, Maryam, Berghoff, Birger, Sohal, Rakesh, Suckow, Stephan, Arguirov, Tzanimir, Wilck, Noël, Mayer, Joachim, Spangenberg, Bernd, Kittler, Martin

Volltext

Turning Low-Nanoscale Intrinsic Silicon Highly Electron-Conductive by SiO 2 Coating von König, Dirk, Frentzen, Michael, Wilck, Noël, Berghoff, Birger, Píš, Igor, Nappini, Silvia, Bondino, Federica, Müller, Merlin, Gonzalez, Sara, Di Santo, Giovanni, Petaccia, Luca, Mayer, Joachim, Smith, Sean, Knoch, Joachim

Volltext

Electronic Structure Shift of Deeply Nanoscale Silicon by Si O 2 versus Si 3 N 4 Embedding as an Alternative to Impurity Doping von König, Dirk, Wilck, Noël, Hiller, Daniel, Berghoff, Birger, Meledin, Alexander, Di Santo, Giovanni, Petaccia, Luca, Mayer, Joachim, Smith, Sean, Knoch, Joachim

Volltext

Intrinsic ultrasmall nanoscale silicon turns n-/p-type with SiO 2 /Si 3 N 4 -coating von König, Dirk, Hiller, Daniel, Wilck, Noël, Berghoff, Birger, Müller, Merlin, Thakur, Sangeeta, Di Santo, Giovanni, Petaccia, Luca, Mayer, Joachim, Smith, Sean, Knoch, Joachim

Volltext

Toward Low‐Power Cryogenic Metal‐Oxide Semiconductor Field‐Effect Transistors von Knoch, Joachim, Richstein, Benjamin, Han, Yi, Frentzen, Michael, Rainer Schreiber, Lars, Klos, Jan, Raffauf, Lena, Wilck, Noel, König, Dirk, Zhao, Qing-Tai

Volltext

Origin and Quantitative Description of the NESSIAS Effect at Si Nanostructures von König, Dirk, Frentzen, Michael, Hiller, Daniel, Wilck, Noël, Di Santo, Giovanni, Petaccia, Luca, Pìs, Igor, Bondino, Federica, Magnano, Elena, Mayer, Joachim, Knoch, Joachim, Smith, Sean C

Volltext bestellen

Electronic Structure Shift of Deep Nanoscale Silicon by SiO$_2$- vs. Si$_3$N$_4$-Embedding as Alternative to Impurity Doping von König, Dirk, Wilck, Noël, Hiller, Daniel, Berghoff, Birger, Meledin, Alexander, Di Santo, Giovanni, Petaccia, Luca, Mayer, Joachim, Smith, Sean, Knoch, Joachim

Volltext bestellen

Origin and Quantitative Description of the NESSIAS Effect at Si Nanostructures von König, Dirk, Frentzen, Michael, Hiller, Daniel, Wilck, Noël, Giovanni Di Santo, Petaccia, Luca, Pìs, Igor, Bondino, Federica, Magnano, Elena, Mayer, Joachim, Knoch, Joachim, Smith, Sean C

Volltext

Electronic Structure Shift of Deep Nanoscale Silicon by SiO\(_2\)- vs. Si\(_3\)N\(_4\)-Embedding as Alternative to Impurity Doping von König, Dirk, Wilck, Noël, Hiller, Daniel, Berghoff, Birger, Meledin, Alexander, Giovanni Di Santo, Petaccia, Luca, Mayer, Joachim, Smith, Sean, Knoch, Joachim

Volltext