O-vacancies in transition metal (TM) oxides: Coordination and local site symmetry of transition and negative ion states in TM2O3 and TMO2 oxides von LUCOVSKY, G, ZELLER, D, WHITTEN, J. L

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Intrinsic band edge traps in nano-crystalline HfO2 gate dielectrics von Lucovsky, G., Zhang, Y., Luning, J., Afanase’v, V.V., Stesmans, A., Zollner, S., Triyoso, D., Rogers, B.R., Whitten, J.L.

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Polar science results from Mars Reconnaissance Orbiter: Multiwavelength, multiyear insights von Landis, M.E., Acharya, P.J., Alsaeed, N.R., Andres, C., Becerra, P., Calvin, W.M., Cangi, E.M., Cartwright, S.F.A., Chaffin, M.S., Diniega, S., Dundas, C.M., Hansen, C.J., Hayne, P.O., Herkenhoff, K.E., Kass, D.M., Khuller, A.R., McKeown, L.E., Russell, P.S., Smith, I.B., Sutton, S.S., Widmer, J.M., Whitten, J.L.

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Chemical bonding and graded interfacial transition regions at transition metal, Hf(Zr), /high- k gate dielectric, Hf(Zr)O 2, interfaces von Lucovsky, G., Whitten, J.L.

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Metal gate electrodes: Theoretical studies of Zr/ZrO 2 and Hf/HfO 2 interfaces von Lucovsky, G., Whitten, J.L.

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O-vacancies in transition metal (TM) oxides: Coordination and local site symmetry of transition and negative ion states in TM 2O 3 and TMO 2 oxides von Lucovsky, G., Zeller, D., Whitten, J.L.

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Theory of chemisorption and reactions on metal surfaces von Whitten, J.L., Yang, H.

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Metal gate electrodes for devices with high-k gate dielectrics: Zr/ZrO 2 and Hf/HfO 2 intrinsic interfacial transition regions von Lucovsky, G., Whitten, J.L.

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Remote plasma-deposited GeO2 with quartz-like Ge- and O-local bonding: Band-edge state and O-vacancy comparisons with SiO2 von Lucovsky, G., Zeller, D., Wu, K., Whitten, J.L.

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Remote plasma-deposited GeO 2 with quartz-like Ge- and O-local bonding: Band-edge state and O-vacancy comparisons with SiO 2 von Lucovsky, G., Zeller, D., Wu, K., Whitten, J.L.

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Chemisorption of hydrogen on the nickel(111) surface von HONG YANG, WHITTEN, J. L

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Metal gate electrodes : Theoretical studies of Zr/ZrO2 and Hf/HfO2 interfaces von LUCOVSKY, G, WHITTEN, J. L

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Chemical bonding and graded interfacial transition regions at transition metal, Hf(Zr), /high-k gate dielectric, Hf(Zr)O2, interfaces von LUCOVSKY, G, WHITTEN, J. L

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Metal gate electrodes for devices with high-k gate dielectrics : Zr/ZrO2 and Hf/HfO2 intrinsic interfacial transition regions von LUCOVSKY, G, WHITTEN, J. L

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Theoretical studies of the chemisorption of hydrogen on copper von Madhavan, P., Whitten, J. L.

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Non-Crystalline SiO2: Processing Induced Pre-Existing Defects Associated with Vacated O-Atom Intrinsic Bonding Sites von Lucovsky, G., Kim, J., Wu, K., Zeller, D., Papas, B., Whitten, J.L.

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Separate and independent control of interfacial band alignments and dielectric constants in transition metal rare earth complex oxides von Lucovsky, G., Zhang, Y., Whitten, J.L., Schlom, D.G., Freeouf, J.L.

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A molecular orbital model for the electronic structure of transition metal atoms in silicate and aluminate alloys von Lucovsky, G, Whitten, J.L, Zhang, Y

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Theoretical studies of surface reactions on metals von Whitten, J.L., Yang, H.

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Suppression of Ge–O and Ge–N bonding at Ge–HfO 2 and Ge–TiO 2 interfaces by deposition onto plasma-nitrided passivated Ge substrates: Integration issues Ge gate stacks into advance... von Lee, S., Long, J.P., Lucovsky, G., Whitten, J.L., Seo, H., Lüning, J.

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