Status of High-Index Materials for Generation-Three 193nm Immersion Lithography von Zimmerman, Paul A., Peski, Chris van, Rice, Bryan, Byers, Jeff, Turro, Nicholas J., Lei, Xuegong, Gejo, Juan Lopez, Liberman, Vladmir, Palmacci, Steve, Rothchild, Mordy, Whitker, Andrew, Blakey, Idriss, Chen, Lan, Dargaville, Bronwin, Liu, Heping

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