Mitigation of surface contamination from resist outgassing in EUV lithography von Mertens, B.M., van der Zwan, B., de Jager, P.W.H., Leenders, M., Werij, H.G.C., Benschop, J.P.H., van Dijsseldonk, A.J.J.

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Comparison of Extreme Ultraviolet Sources for Lithography Applications von Banine, V.Y., Benschop, J.P.H., Werij, H.G.C.

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Light-induced drift of Na atoms von Werij, H.G.C., Woerdman, J.P.

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Lyman-[alpha] spectroscopy of magnetically trapped atomic hydrogen von Luiten, O.J., Werij, H.G.C., Setija, I.D., Reynolds, M.W., Hijmans, T.W., Walraven, J.T.M.

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Evaporative cooling of magnetically trapped atomic hydrogen von Luiten, O.J., Werij, H.G.C., Reynolds, M.W., Setija, I.D., Hijmans, T.W., Walraven, J.T.M.

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