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  1. 1
    Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects

    Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects von Liu, Eric, Hegazy, Amir, Choi, Hyeonseon, Weires, Maximilian, Brainard, Robert, Denbeaux, Gregory


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  2. 2
    EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes

    EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes von Murphy, Michael, Weires, Maximilian, Upadhyay, Nitinkumar S., Schuler, Philip, Hasan, Shaheen, Denbeaux, Greg, Brainard, Robert L.


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