A new type of heterojunction a-Si photodiode for lensless contact-type image sensor von SHIDOH, Y, HAGA, K, YAMAMOTO, K, MURAKAMI, A, KUMANO, M, WATANABE, H

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Properties of silicon-oxygen alloy films prepared from SiH4+CO2 gas mixture von HAGA, K, MURAKAMI, A, YAMAMOTO, K, KUMANO, M, WATANABE, H

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Properties of Photosensor with Amorphous Si:H/SiO x :H Double-Layer Structure von Haga, Koichi, Murakami, Akishige, Adachi, Kazuhiko, Watanabe, Masafumi Kumano

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Properties of Silicon-Oxygen Alloy Films Prepared from SiH 4 +CO 2 Gas Mixture von Haga, Koichi, Murakami, Akishige, Yamamoto, Kenji, Watanabe, Masafumi Kumano

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ELECTROMAGNETIC WAVE SHIELDING MATERIAL, ELECTROMAGNETIC WAVE SHIELDING CABLE, ELECTROMAGNETIC WAVE SHIELDING TAPE, AND WIRE HARNESS von KUMANO MASAFUMI, WATANABE KAZUO

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Properties of photosensor with amorphous Si:H/SiOx:H double-layer structure von HAGA, K, MURAKAMI, A, ADACHI, K, KUMANO, M, WATANABE, H

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Wide optical-gap a-Si:O:H films prepared from SiH4―CO2 gas mixture von HAGA, K, YAMAMOTO, K, KUMANO, M, WATANABE, H

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Wide Optical-Gap a-Si:O:H Films Prepared from SiH 4 –CO 2 Gas Mixture von Haga, Koichi, Yamamoto, Kenji, Kumano, Masafumi, Watanabe, Hideo

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